Diffusional Relaxation in Random Sequential Deposition

Eli Eisenberg,Asher Baram
DOI: https://doi.org/10.1088/0305-4470/30/9/003
1996-10-25
Abstract:The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expression for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.
Statistical Mechanics
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