Amorphous intergranular films act as ultra-efficient point defect sinks during collision cascades

Joseph E. Ludy,Timothy J. Rupert
DOI: https://doi.org/10.1016/j.scriptamat.2015.07.040
IF: 6.302
2016-01-01
Scripta Materialia
Abstract:Atomistic simulations are used to explore the effect of interfacial structure on residual radiation damage. Specifically, an ordered grain boundary is compared to a disordered amorphous intergranular film, to investigate how interface thickness and free volume impacts point defect recombination. Collision cascades are simulated and residual point defect populations are analyzed as a function of boundary type and primary knock on atom energy. While ordered grain boundaries easily absorb interstitials, these interfaces are inefficient vacancy sinks. Alternatively, amorphous intergranular films act as ultra-efficient, unbiased defect sinks, providing a path for the creation of radiation-tolerant materials.
materials science, multidisciplinary,nanoscience & nanotechnology,metallurgy & metallurgical engineering
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