Abstract:Background: Nanoimprinting lithography technique uses a very simple concept of transferring pattern of nanoscale features from a mold to a target substrate. In the past two decades, this technique has successfully broken through the barrier of laboratory scale production and become an industrial scale production technique. The aim of this paper is to introduce to readers to the basic working principle, applications, analysis the technological limitations. It will also point out future research direction of this useful nanofabrication technique.Methods: We adopted a systematic approach to give a comprehensive review of the work principle, hardware and analysis of advantaged and disadvantages of major nanoimprint lithography techniques. Moreover, a technical comparison of these methods is carried out to provide future research direction.Results: 87 papers were reviewed. Four techniques including thermal NIL, ultraviolet light NIL, laser-assisted direct imprint and nanoelectrode lithography have been identified as main stream of NIL techniques. These techniques possess certain advantages and disadvantages in terms of cost, throughput, attainable resolution. Lack of flexibility is the common limitation of current NIL techniques. NIL has gained wide applications in the fabrication of optoelectronics devices, solar cells, memory devices, nanoscale cells, hydrophobic surfaces and bio-sensors. The potential applications of NIL in biochips, artificial organs, diagnostic system, and fundamental research in cell biology will demand large scale 3D fabrication capability with resolution towards 10nm or less.Conclusions: The findings of this review confirm that NIL is one of the most employed commercial platforms for nanofabrication which offers high throughput and cost-effectiveness. One of the disadvantages of NIL over other nanofabrication techniques is the flexibility of patterning. Integrating NIL with other existing nanofabrication techniques can be helpful to overcome such issue. The potential applications of NIL in biochips, artificial organs, diagnostic system, and fundamental research in cell biology will attract researchers to push nanoimprint lithography forward at a resolution of 10 nm or less in the future.

Crafting at the nanoscale: A comprehensive review of mechanical Atomic force microscopy-based lithography methods and their evolution

Scanning Probe Lithography: State-of-the-Art and Future Perspectives

Towards smart scanning probe lithography: a framework accelerating nano-fabrication process with in-situ characterization via machine learning

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

High-resolution scanning probe lithography technology: a review

Advanced scanning probe lithography

A Compliant Nano-manipulator-based Scanning Probe Lithography System

Ultralarge-Area Stitchless Scanning Probe Lithography and in Situ Characterization System Using a Compliant Nanomanipulator

Thermal scanning probe lithography—a review

Thermal Scanning-Probe Lithography for Broad-Band On-Demand Plasmonic Nanostructures on Transparent Substrates

Applications of Scanning Probe Microscopy in Nanolithography on Alkanethiol Self-Assembled Monolayers

Application Of Scanning Probe Microscopy In Nanofabrication

Application of Scanning Probe Oxidation Lithography in Fabrication of Micro-Nano Devices

Plasmonic Nanolithography: A Review

Nanoimprint Lithography - the Past, the Present and the Future

Fabrication of Nano-Scale Reference Materials with Scanning Probe Microscopy (Spm)-Based Lithography

Scanning probe lithography on calixarene towards single-digit nanometer fabrication

A Cantilever-Free Approach to Dot-Matrix Nanoprinting

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Current Developments And Applications Using Multi-Beam Laser Interference Lithography For Nanoscale Structuring Of Materials

Recent Progress in Near‐Field Tip Enhancement: Principles and Applications