Dielectric Study of n -Propanol during Physical Vapor Deposition: No Surface Mobility and No Kinetic Stability

R. Richert
DOI: https://doi.org/10.1021/acs.jpcb.4c01904
IF: 3.466
2024-05-24
The Journal of Physical Chemistry B
Abstract:Dielectric relaxation experiments have been performed on n-propanol (NPOH) films during physical vapor deposition at temperatures above and below its glass transition, T(g) = 97 K. The results for NPOH are compared with those of analogous experiments on methyl-m-toluate (MMT) and 2-methyltetrahydrofuran (MTHF), with all three deposited at the same reduced temperature, 0.82T(g). While MMT and MTHF display clear signs of a highly mobile surface layer, no such feature is observed for NPOH. The...
chemistry, physical
What problem does this paper attempt to address?