Development of dual‐beamline photoelectron momentum microscopy for valence orbital analysis

Kenta Hagiwara,Eiken Nakamura,Seiji Makita,Shigemasa Suga,Shin-ichiro Tanaka,Satoshi Kera,Fumihiko Matsui
DOI: https://doi.org/10.1107/s1600577524002406
IF: 2.557
2024-04-16
Journal of Synchrotron Radiation
Abstract:The only photoelectron momentum microscopy experimental station at the UVSOR Synchrotron Facility has been developed by simultaneously using soft X‐ray and vacuum ultraviolet beamlines. Atomic orbital analysis of the valence band structure of Au(111) was performed using normal‐incidence photoemission geometry.The soft X‐ray photoelectron momentum microscopy (PMM) experimental station at the UVSOR Synchrotron Facility has been recently upgraded by additionally guiding vacuum ultraviolet (VUV) light in a normal‐incidence configuration. PMM offers a very powerful tool for comprehensive electronic structure analyses in real and momentum spaces. In this work, a VUV beam with variable polarization in the normal‐incidence geometry was obtained at the same sample position as the soft X‐ray beam from BL6U by branching the VUV beamline BL7U. The valence electronic structure of the Au(111) surface was measured using horizontal and vertical linearly polarized (s‐polarized) light excitations from BL7U in addition to horizontal linearly polarized (p‐polarized) light excitations from BL6U. Such highly symmetric photoemission geometry with normal incidence offers direct access to atomic orbital information via photon polarization‐dependent transition‐matrix‐element analysis.
optics,physics, applied,instruments & instrumentation
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