Ni-doped HfSe2 monolayer as a gas scavenger toward SO2 and SOF2: a DFT study

Zengting Wang,Xiaoxing Zhang,Jiawei Yuan,Senyuan Tan
DOI: https://doi.org/10.1080/00268976.2023.2202282
2023-04-27
Molecular Physics
Abstract:In this work, the adsorption behavior of a monolayer of HfSe 2 (Ni-HfSe 2 ) decorated with a Ni catalyst toward the SF 6 decomposed gases SO 2 and SOF 2 is examined using the first-principles theory. On the pure HfSe 2 surface, Ni atom as the catalyst substitutes the Se atom. This theoretical work investigates the geometry configurations of Ni-HfSe 2 monolayers both before and after gas adsorption, as well as the electronic properties and sensitivities. The greater performance of the Ni-HfSe 2 monolayer on the SO 2 molecule is implied by the simulation's calculation of the of SO 2 and SOF 2 gas adsorption systems as −2.21 eV and −0.68 eV, respectively. This is further verified by the DOS, BS and WF analyses. The formula predicts that the Ni-HfSe 2 monolayer can detect SO 2 and SOF 2 with sensitivity up to −80.89% and 105.59%, respectively, at room temperature (298 K), which demonstrates the sensor's advantageous sensitivity to both gases as a chemical resistance-type sensor. It is hopeful that a Ni-HfSe 2 monolayer-based gas sensor will be able to distinguish between SO 2 and SOF 2 in a single gas atmosphere. In conclusion, this study may promote the steady operation of the power system and provide some guidance for cutting-edge electrical engineering resistance-type sensing materials. GRAPHICAL
chemistry, physical,physics, atomic, molecular & chemical
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