Spatial Diffusion of Hydrogen Atoms in Normal and Para-Hydrogen Molecular Films at Temperature 0.7 K

S. Sheludiakov,C. K. Wetzel,D. M. Lee,V. V. Khmelenko,J. Järvinen,J. Ahokas,S. Vasiliev
DOI: https://doi.org/10.1007/s10909-024-03053-w
2024-02-29
Journal of Low Temperature Physics
Abstract:We report on electron spin resonance studies of H atoms stabilized in solid H films at temperature 0.7 K and in a magnetic field of 4.6 T. The H atoms were produced by bombarding H films with 100 eV electrons from a radiofrequency discharge run in the sample cell. We observed a one order of magnitude faster H atom accumulation in the films made of para-H gas with a small ortho-H concentration (0.2% ortho-H ) as compared with those made from normal H gas content (75% ortho-H ). We also studied the influence of ortho-H molecules on spatial diffusion of H atoms in solid H films. The spatial diffusion of H atoms in both normal and para-H films is faster than the diffusion obtained from the measurement of H atom recombination. The rate of spatial diffusion of H atoms in para-H films was slower in comparison with that in the normal H films. We discuss possible explanations of these observations.
physics, condensed matter, applied
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