Application of InP Quantum Dot film by Photolithography Technology on a Micro-LED Display

Wenya Tian,Tianxiang Wu,Yongshuan Wu,Jinqing Xiao,Pengkai Wang,Junhui Li
DOI: https://doi.org/10.1149/2162-8777/acc5b0
IF: 2.2
2023-03-22
ECS Journal of Solid State Science and Technology
Abstract:The technical challenge of realizing full-color display by monochromatic integrated 100×100 blue Micro-LED array exciting InP quantum dot color conversion layer was investigated. Using photolithography technology to prepare color film on a separate glass cover glass has the advantages of better accuracy and display resolution. The optimum thickness of the quantum dot photoresist (QDPR) was verified at 12 μm and a 10 μm black matrix was proposed to reduce the light crosstalk between different sub-pixels. The thickness of color filter 1±0.4 μm was made successfully between the QDPR and the cover glass, which can significantly increase the display color gamut from 78.7% to 100.8% NTSC. The red and green conversion efficiency reached 78.1% and 296.5%, respectively. Representative RGB monochromatic pictures with 100% high yield were displayed successfully.
materials science, multidisciplinary,physics, applied
What problem does this paper attempt to address?