Boosting nonradical process in BiOI/BiOCl heterostructure by interface oxygen vacancies

Hailan Qin,Jingyu Sun,Dongsheng Xia,Haiming Xu,Qilin Yu,Yi Zheng,Yintao Shi
DOI: https://doi.org/10.1016/j.cej.2022.134847
IF: 15.1
2022-05-01
Chemical Engineering Journal
Abstract:Boosting nonradical (1O2, e− and h+) process to enhance the selective degradation for electrophilicity contaminants is an ingenious strategy. Herein, BiOI/BiOCl heterojunction with rational interface oxygen vacancies (IOVs) concentration was successfully synthesized by ultrasonic method. Moreover, multi-characterization and interference experimental unveiled that the appropriate IOVs concentration can not only effectively reduce the transport resistance of photo-induced carriers but also boost the nonradical process. Thus, BOC-5 can remove 84% (20 mg/L) tetracycline hydrochloride (TC-HCl) in 1 h and present wonderful insecticidal performance for rotifers. Simultaneously, the quantitative methods of IOVs concentration, the contribution of the active species to the catalytic performance and the contribution of different 1O2 source to the total 1O2 were established for the first time. Furthermore, the structure–activity relationship between the IOVs concentration and the catalytic properties was firstly constructed. This work provides an inventive idea to purify water pollutants and disinfestation by boost nonradical process via interface defect engineering.
What problem does this paper attempt to address?