Biomimetic Moth-eye Nanofabrication: Enhanced Antireflection with Superior Self-cleaning Characteristic

Jingyao Sun,Xiaobing Wang,Jinghua Wu,Chong Jiang,Jingjing Shen,Merideth A. Cooper,Xiuting Zheng,Ying Liu,Zhaogang Yang,Daming Wu
DOI: https://doi.org/10.1038/s41598-018-23771-y
IF: 4.6
2018-04-03
Scientific Reports
Abstract:AbstractSub-wavelength antireflection moth-eye structures were fabricated with Nickel mold using Roll-to-Plate (R2P) ultraviolet nanoimprint lithography (UV-NIL) on transparent polycarbonate (PC) substrates. Samples with well replicated patterns established an average reflection of 1.21% in the visible light range, 380 to 760 nm, at normal incidence. An excellent antireflection property of a wide range of incidence angles was shown with the average reflection below 4% at 50°. Compared with the unpatterned ultraviolet-curable resin coating, the resulting sub-wavelength moth-eye structure also exhibited increased hydrophobicity in addition to antireflection. This R2P method is especially suitable for large-area product preparation and the biomimetic moth-eye structure with multiple performances can be applied to optical devices such as display screens, solar cells, or light emitting diodes.
multidisciplinary sciences
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