Removal of Th(IV) ion from wastewater using a proper Schiff base impregnated onto Amberlite XAD-4

Z. Shiri-Yekta
DOI: https://doi.org/10.1080/02726351.2018.1508099
IF: 2.628
2019-02-11
Particulate Science And Technology
Abstract:An Amberlite XAD-4 resin loaded with a Schiff base ligand was used for the removal of Th(IV)ions from aqueous solution. The procedure was based on the adsorption of Th(IV) ions on Amberlite XAD-4 resin loaded with a synthesized tetradentate Schiff base bis(2-hydroxybenzaldehyde)-1,2-ethylendiimine prior to their determination by inductive coupled plasma-mass spectrometry. The effect of parameters influencing such as aqueous phase pH, contact time, adsorbent dosage and temperature dependency of the process and the effect of interfering ions was verified and discussed. Under optimal conditions (pH= 5, adsorbent amount 0.1 g, contact time 45 min, and at temperature of 25 °C) for Th(IV) ions (initial concentration 20 mg/L) were quantitatively removed from 20 mL of the sample solution. A comparison of the adsorption efficiency of the studied resin loaded with a Schiff base with those unloaded ones shows a shift for uptake of the metal ions vs. pH curves towards lower pH values by applying the loaded resin with Schiff base (about ΔpH0.5=1.9). The kinetic data corresponds well to the pseudo-second-order equation. The adsorption data for the studied ions were well fitted by the Freundlich isotherm. Thermodynamic investigation reveals that the adsorption process of the studied ions is entropy driven.
engineering, chemical
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