Freestanding Graphene Fabric Film for Flexible Infrared Camouflage
Guang Cui,Zhe Peng,Xiaoyan Chen,Yi Cheng,Lin Lu,Shubo Cao,Sudong Ji,Guoxin Qu,Lu Zhao,Shaokai Wang,Shida Wang,Yizhen Li,Haina Ci,Maoyuan Li,Zhongfan Liu
DOI: https://doi.org/10.1002/advs.202105004
IF: 15.1
2021-12-16
Advanced Science
Abstract:Graphene films, fabricated by chemical vapor deposition (CVD) method, have exhibited superiorities in high crystallinity, thickness controllability, and large-scale uniformity. However, most synthesized graphene films are substrate-dependent, and usually fragile for practical application. Herein, a freestanding graphene film is prepared based on the CVD route. By using the etchable fabric substrate, a large-scale papyraceous freestanding graphene fabric film (FS-GFF) is obtained. The electrical conductivity of FS-GFF can be modulated from 50 to 2800 Ω sq<sup>-1</sup> by tailoring the graphene layer thickness. Moreover, the FS-GFF can be further attached to various shaped objects by a simple rewetting manipulation with negligible changes of electric conductivity. Based on the advanced fabric structure, excellent electrical property, and high infrared emissivity, the FS-GFF is thus assembled into a flexible device with tunable infrared emissivity, which can achieve the adaptive camouflage ability in complicated backgrounds. This work provides an infusive insight into the fabrication of large-scale freestanding graphene fabric films, while promoting the exploration on the flexible infrared camouflage textiles.
materials science, multidisciplinary,nanoscience & nanotechnology,chemistry