Chiral thin solid films: Method of deposition and applications

R. M. A. Azzam
DOI: https://doi.org/10.1063/1.107979
IF: 4
1992-12-28
Applied Physics Letters
Abstract:Chiral thin solid films (CTSFs) can be deposited on a solid substrate in vacuum by letting a vapor stream of film material impinge on the substrate at oblique incidence and rotating the substrate during deposition. The direction of substrate rotation determines the handedness of the resulting helical structure which resembles that of a cholesteric or twisted-nematic liquid crystal layer. CTSFs are useful in making new optical rotators and beam splitters that separate the orthogonal circular polarization components of light. A quadrant-detector ellipsometer that uses chiral and achiral obliquely deposited thin films is described for measuring the state of polarization of light.
physics, applied
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