Enabling high performance n-type metal oxide semiconductors at low temperatures for thin film transistors

Nidhi Tiwari,Amoolya Nirmal,Mohit Rameshchandra Kulkarni,Rohit Abraham John,Nripan Mathews

DOI: https://doi.org/10.1039/d0qi00038h

IF: 7.779

2020-01-01

Inorganic Chemistry Frontiers

Abstract:The review highlights low temperature activation processes for high performance n-type metal oxide semiconductors for TFTs.

chemistry, inorganic & nuclear