Tantalum coating inhibits Ni-migration from titanium out-diffusion in NiTi shape memory biomedical alloy

K. McNamara,S. Beloshapkin,K.M. Hossain,M.S. Dhoubhadel,S.A.M Tofail
DOI: https://doi.org/10.1016/j.apsusc.2020.147621
IF: 6.7
2021-01-01
Applied Surface Science
Abstract:<p>Despite the presence of over 56% Ni by weight, equiatomic NiTi is generally considered biocompatible as it naturally oxidises to form a surface oxide mainly composed of biocompatible oxides of titanium (TiO<sub>x</sub>). This layer is formed by an oxidation mechanism that promotes out-diffusion of Ti leaving a Ti-depleted, Ni rich subsurface. The long-term <em>in vivo</em> stability of the naturally grown TiO<sub>x</sub> layer has been a concern as Ni can leach out through this thin, defective layer. The leaching of nickel (Ni) is thus a continuing threat to the alloy's otherwise outstanding biocompatibility. We have found that a layer of reactively sputtered tantalum (Ta) oxide on the bulk NiTi restricts Ti-out-migration through a biocompatible Ti/Ta inter-diffusion layer that provides a larger barrier against Ni leaching. We have investigated this inter-diffusion as a function of sputtering process parameters and post processing treatments. Surface and interface analytical techniques such as X-ray photoelectron spectroscopy, scanning electron microscopy, energy dispersive X-ray spectroscopy, cross sectional transmission electron microscopy and non-destructive ion beam analysis techniques such as Rutherford backscattering spectrometry and particle induced X-ray emission were used to evaluate the nature of this inter-diffusion layer which can improve long-term biocompatibility of NiTi.</p>
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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