Stoichiometry-modulated dual epsilon-near-zero characteristics of niobium nitride films

Yujing Ran,Huiping Lu,Shujun Zhao,Qian Guo,Chang Gao,Zhaotan Jiang,Zhi Wang
DOI: https://doi.org/10.1016/j.apsusc.2020.147981
IF: 6.7
2021-01-01
Applied Surface Science
Abstract:<p>Metal nitride is an important new type of Epsilon-near-zero (ENZ) materials applicable in visible and near infrared. In this study, NbN<sub><em>x</em></sub> films with different nitrogen content <span class="math"><math>Rn</math></span> were prepared by magnetron sputtering. The results show that the films are stoichiometry-tunable on the lattice constant, chemical state, and plasmonic properties. Importantly, NbN<sub><em>x</em></sub> films exhibit dual ENZ behavior tunable in the range of 400 to 1000 nm, and the absolute value of the negative real part of epsilon is below 1.0. Increased <span class="math"><math>Rn</math></span> reduces the screened plasma frequency and narrows the ENZ range by introducing different non-stoichiometric defects. The result of first-principle calculation show that non-stoichiometric defects affect the band structure and the density of states, and the cation vacancies are the main defects tailoring the ENZ behavior of the NbN<sub><em>x</em></sub> films. As examples of the application, we provide conceptual designs of angular filter and perfect absorber, the performances of which can be enhanced by NbN<sub><em>x</em></sub> films. NbN<sub><em>x</em></sub> is proved to be an ENZ material with simple composition, easy preparation and high tunability in a wide range. The tunable dual ENZ characteristics of NbN<sub><em>x</em></sub> films highlight their significant future in visible and near infrared nanophotonic applications.</p>
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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