Preparation and characterization of vanadium-doped nickel oxide nanostructure deposited by dip-coating technique

F. Chharganeh kalangestani,M. Simiari,F. E. Ghodsi
DOI: https://doi.org/10.1140/epjp/s13360-021-01513-w
2021-05-01
The European Physical Journal Plus
Abstract:We investigated the effect of vanadium doping on chemical and physical properties of nickel oxide thin films grown on the glass substrates by the dip-coating technique. FTIR studies approved the formation of NiO bonds. XRD patterns indicated that all samples have a cubic structure, while have occurred some changes in FWHM and position of peaks with doping of V. The surface topography of V-doped NiO film at 10% shows that the grains were grown in the form of a channel-island pattern. The surface roughness decreases slightly with the addition of vanadium at first and then rises with increasing concentration of vanadium. The superhydrophilic nature of V-doped NiO films (contact angle, θ &lt; 15°) indicates that those are suitable for self-cleaning application. Optical transmittance of the NiO:V thin film increases with the adding V dopant. However, with increasing V concentration, the optical transmittance decreases. Vanadium doping of NiO thin films led to decrease in the band gap of energy. Also, V doping leads to a slight red shift of the PL spectrum of the films. The highest amount of interfacial capacity (24.2 mF.cm<sup>−2</sup>) and charge density (15.7 mC.cm<sup>−2</sup>) were obtained for NiO:V (10%) sample.
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