Nanofocusing probe optimization with anti-reflection coatings for a high-density optical memory

I D Nikolov,K Kurihara,K Goto
DOI: https://doi.org/10.1088/0957-4484/14/9/302
IF: 3.5
2003-07-15
Nanotechnology
Abstract:We discuss the optimization aspects of nanofocusing recording probes. In this paper we also research all of the technological aberrations affecting the nanofocused spots. The probe numerical aperture (NA) has been elevated about threefold from 0.72 to 2.15 optimizing the diffraction functions under the full width at half maximum (FWHM) size of 130 nm. The microlens (ML) physical light efficiency is about nine times higher than the values published in previous works. The nanofocused spot is calculated as 25 nm for a micro-laser beam of 8 µm and the diffraction limit is 150 nm using NA = 2.153 for an entire ML diameter over 13 µm. We have obtained nanofocused spots from 20 nm at the geometrical limit and up to 130 nm at the diffraction FWHM size using anti-reflection coatings on both surfaces of the fabricated GaP ML array. The optical power throughput of the nanofocusing probe has been raised 4.0–4.75-fold applying antireflection optimization.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
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