Abstract:Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 1977(1). They offer the advantages of low weight, easy tailoring of properties and a wide spectrum of applications(2,3). Due to sensitivity of conducting polymers to environmental conditions (e.g., air, oxygen, moisture, high temperature and chemical solutions), lithographic techniques present significant technical challenges when working with these materials(4). For example, current photolithographic methods, such as ultra-violet (UV), are unsuitable for patterning the conducting polymers due to the involvement of wet and/or dry etching processes in these methods. In addition, current micro/nanosystems mainly have a planar form(5,6). One layer of structures is built on the top surfaces of another layer of fabricated features. Multiple layers of these structures are stacked together to form numerous devices on a common substrate. The sidewall surfaces of the microstructures have not been used in constructing devices. On the other hand, sidewall patterns could be used, for example, to build 3-D circuits, modify fluidic channels and direct horizontal growth of nanowires and nanotubes. A macropunching method has been applied in the manufacturing industry to create macropatterns in a sheet metal for over a hundred years. Motivated by this approach, we have developed a micropunching lithography method (MPL) to overcome the obstacles of patterning conducting polymers and generating sidewall patterns. Like the macropunching method, the MPL also includes two operations (Fig. 1): (i) cutting; and (ii) drawing. The "cutting" operation was applied to pattern three conducting polymers(4), polypyrrole (PPy), Poly(3,4-ethylenedioxythiophen)-poly(4-styrenesulphonate) (PEDOT) and polyaniline (PANI). It was also employed to create Al microstructures(7). The fabricated microstructures of conducting polymers have been used as humidity(8), chemical(8), and glucose sensors(9). Combined microstructures of Al and conducting polymers have been employed to fabricate capacitors and various heterojunctions(9,10,11). The "cutting" operation was also applied to generate submicron-patterns, such as 100- and 500-nm-wide PPy lines as well as 100-nm-wide Au wires. The "drawing" operation was employed for two applications: (i) produce Au sidewall patterns on high density polyethylene (HDPE) channels which could be used for building 3D microsystems(12,13,14), and (ii) fabricate polydimethylsiloxane (PDMS) micropillars on HDPE substrates to increase the contact angle of the channel(15).

Patterning of Polymer Electrodes by Nanoscratching

Selective Electroless Metallization of Micro- and Nanopatterns via Poly(dopamine) Modification and Palladium Nanoparticle Catalysis for Flexible and Stretchable Electronic Applications.

Tunable patterning of microscale particles using a surface acoustic wave device with slanted-finger interdigital transducers

Patterned PEDOT:PSS-Flexible Electrode Using Electrospinning Nano-Fiber Substrate with UV-Induced Selective Wettability

Laser patterned polymer/nanotube composite electrodes for nanowire transistors on flexible substrates

Directly Patterning Conductive Polymer Electrodes on Organic Semiconductor via In Situ Polymerization in Microchannels for High-Performance Organic Transistors

Direct electron beam patterning of electro-optically active PEDOT:PSS

Patterning of periodic nano-cavities on PEDOT–PSS using nanosphere-assisted near-field optical enhancement and laser interference lithography

Femtosecond Laser Patterning Wettability‐Assisted PDMS for Fabrication of Flexible Silver Nanowires Electrodes

Electrochemical Replication and Transfer for Low-Cost, Sub-100 Nm Patterning of Materials on Flexible Substrates.

Electropolymerization processing of side-chain engineered EDOT for high performance microelectrode arrays

Stepwise Aggregation Control of PEDOT:PSS Enabled High-Conductivity, High-Resolution Printing of Polymer Electrodes for Transparent Organic Phototransistors

Solid-state electrochemical oxidation with polyelectrolyte membrane stamps for micro-/nanoscale pattern formation on Au surfaces

One-Step Patterning of Organic Semiconductors on Gold Electrodes via Capillary-Bridge Manipulation

Electrochemical Polymerization and Properties of PEDOT/S-EDOT on Neural Microelectrode Arrays

Synthesis of PEDOT:PSS Brushes Grafted from Gold Using ATRP for Increased Electrochemical and Mechanical Stability

Micropunching lithography for generating micro- and submicron-patterns on polymer substrates

Non-destructive Patterning of Carbon Electrodes by Using the Direct Mode of Scanning Electrochemical Microscopy

A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching.

A bioinspired surface coating approach for enhancing adhesion and scratch resistance in screen printed flexible circuits

High‐Resolution and Facile Patterning of Silver Nanowire Electrodes by Solvent‐Free Photolithographic Technique Using UV‐Curable Pressure Sensitive Adhesive Film