Frame-Dilated Convolutional Fusion Network and GRU-Based Self-Attention Dual-Channel Network for Soft-Sensor Modeling of Industrial Process Quality Indexes
Jinping Liu,Jiezhou He,Zhaohui Tang,Yongfang Xie,Weihua Gui,Tianyu Ma,Hadi Jahanshahi,Ayman A. Aly
DOI: https://doi.org/10.1109/tsmc.2021.3130232
2021-01-01
IEEE Transactions on Systems, Man, and Cybernetics: Systems
Abstract:Due to technical or economic limitations, timely measuring quality-relevant key performance indicators (KPIs) of complex industrial processes (CIPs), especially the chemical composition-related indexes, is intractable. Process monitoring image sequences (PMISs) usually involve significant information about the operation states and KPIs. Thus, soft sensor-based online KPI inference by incorporating process monitoring variables (TPMVs) and PMISs is more promising. However, the extremely inconsistent sampling rates with different expression forms and concerning aspects between PMISs and TPMVs lead to a great challenge in the soft sensor modeling by combining PMISs and TPMVs. In this article, a self-attention dual-channel deep network (SADCDN)-based soft sensor model for the end-to-end online KPI detection/prediction is proposed. Specifically, one channel adopts the gated recurrent unit (GRU) network to extract intrinsic time-series features in TPMVs, and simultaneously the other channel introduces a novel frame-dilated convolution fusion neural network (FDCFNN) to extract intrinsic spatiotemporal features from PMISs to address the sampling inconsistence between PMISs and TPMVs. Successively, dual-channel network features with different concerning aspects are weighted and fused based on an introduced self-attention mechanism to bridge the gap of sampling rates and concerning aspects between PMISs and TPMVs for the soft sensor modeling. Practical application results on two real industrial processes, the bauxite flotation process and the sintering process of a cement rotary kiln, have demonstrated the effectiveness and superiority of the proposed dual-channel model, laying a foundation for the process optimization of CIPs.