On-line Measurement of Styrene Secondary Organic Aerosol Using Synchrotron Radiation Vacuum Ultraviolet Photoionization Aerosol Mass Spectrometer

Ming-Qiang Huang,Xiao-Bin Shan,Liu-Si Sheng,Zhen-Ya Wang,Chang-Jin Hu,Xue-Jun Gu,Wei-Jun Zhang
DOI: https://doi.org/10.19756/j.issn.0253-3820.231105
IF: 1.193
2024-01-01
Chinese Journal of Analytical Chemistry
Abstract:Secondary organic aerosol (SOA) produced by photooxidation of styrene and other aromatic compounds is a major part of fine particles in urban atmosphere. In this study, the measurement of component and content of SOA formed from photooxidation of styrene in smog chamber using synchronous radiation vacuum-ultraviolet photoionization aerosol mass spectrometer (VUV-PIAMS) was conducted. Photoionization mass spectra of styrene SOA was detected by synchrotron radiation photon with 10.5 eV, and the proportion of main components was quantified based on the peak area of each ion peak. The photoionization efficiency curve of ion peak was obtained under synchrotron radiation photons in the range from 7.5 to 11.5 eV, and then the ionization potential was acquired for qualitative analysis of the component structure. The results showed that the photoionization mass spectra of styrene SOA mainly contained ion peaks at miz 106, 108, 120 and 122, and the ionization potentials of each peak were (9.41 +/- 0.03) eV, (8.93 +/- 0.03) eV, (9.24 +/- 0.03) eV and (9.25 +/- 0.03) eV, respectively. Combined with quantum chemistry calculation and off-line measurement verification of infrared absorption spectra and electrospray ionization mass spectra, it was determined that benzaldehyde, benzyl alcohol, 4-vinylphenol and benzoic acid were main components of styrene SOA, accounting for 32.5%, 17.5%, 25% and 15% of the measured components, respectively, and the generated quantity ratio was 13 :7 : 10 : 6. VUV-PIAMS could overcome the disadvantages of off-line method, and could on-line detect component and content of SOA, proving a useful tool to measure the chemical components and reveal the formation process of SOA particles.
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