Design and Optimization of InAs Waveguide-Integrated Photodetectors on Silicon Via Heteroepitaxial Integration for Mid-Infrared Silicon Photonics

Hua Ge,Hao Luo,Sheng-Yi Wang,Xiang Li,Pei Liu,Shi Pu,Ning Xu,Bo-Wen Jia
DOI: https://doi.org/10.1109/jphot.2024.3450091
IF: 2.4
2024-01-01
IEEE Photonics Journal
Abstract:Waveguide-integrated photodetectors (PDs) play a crucial role in mid-infrared (MIR) silicon photonics, serving vital functions in sensing and communication applications. III-V semiconductors are widely used in MIR PDs, and many state-of-the-art III-V PDs on Si still require complicated integration methods. Heteroepitaxial growth technology is a competitive approach for large-scale integration; however, buffers capable of simultaneously achieving heteroepitaxial growth and optical coupling are limited in the MIR region. In this paper, we report a waveguide-integrated InAs PD on Si, incorporating a GaAs/Ge buffer design based on interfacial misfit (IMF) technology. We optimize the geometric structure and calculate the optoelectronic properties at a wavelength of 3 μm. For our simulated parameters, the optimal PD achieves a responsivity of 2.77 A/W and a detectivity of 4.68×109 cm·Hz1/2·W-1 at -1V. This work suggests a promising avenue to further develop high-detectivity and high-speed PDs for MIR silicon photonics.
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