Autocatalytic Oxidation of Thiophene Derivatives and Co-Degradation of Refractory Contaminants in Fenton Reaction

Yaodan Cui,Yini He,Ying Jin,Zhichao Yang,Chao Shan,Qingrui Zhang,Weiming Zhang,Bingcai Pan
DOI: https://doi.org/10.1016/j.cej.2024.153954
IF: 15.1
2024-01-01
Chemical Engineering Journal
Abstract:The sluggish reduction of Fe(III) to Fe(II) restricts the decontamination efficiency of Fenton reactions. New strategy development toward enhancing Fe(II) regeneration and decontamination efficiency relies primarily on the well-established inorganic Fenton chemistry, yet the involvement of organic contaminants and its potential role in the Fenton reactions have been insufficiently concerned. Here, using 2,5-thiophene carboxylic acid (TDA) as a representative sulfur-containing heterocyclic contaminant and atrazine as a coexisting contaminant, we uncovered the promoting effect of thiophene derivatives on Fenton oxidation. The degradation of TDA and coexisting refractory contaminants was highly efficient in the sluggish Fe(III)/H 2 O 2 oxidation process with autocatalytic features. Spin trapping and chemical scavenging results underpinned the crucial contribution of hydroxyl radicals (HO center dot ) to organic oxidation. Analysis of iron cycling combined with theoretical calculations revealed that the enhancement of TDA on Fenton oxidation originated from the rapid reduction of Fe(III) by the primary radicals generated from addition of HO center dot to the thiophene ring.
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