P‐113: Ferroelectric LC Aligned on SiO2 Thin Films Using the Ion Beam Deposition and Its Applications

Xihua Li,Anatoli Murauski,Vladimir G. Chigrinov,A. F. Khokhlov,E. Khokhlov

DOI: https://doi.org/10.1889/1.2785380

2007-01-01

Abstract:The uniform alignment of Ferroelectric LCs (FLC) on inorganic thin film surfaces can be obtained using oblique ion beam sputtering deposition on substrates. Large deposition angle from 60° to 80 ° can be used for thin SiO2 alignment layer, which thickness can vary from 5nm to 40 nm. Two types of uniform alignment of “chevron” (before electrical treatment) and “quazi‐bookshelf” (after electrical treatment) were studied. The applications using this unique technology in low power consumption displays, fast switching color displays, future LCD‐TVs and fiber optics are discussed. High quality alignment on large size substrates is also easily achieved because of the linear design of the ion beam sputtering source, which is a big challenge for FLC on SiOx layers before.