Abstract:Scanning electron microscope (SEM) metrology is critical in semiconductor manufacturing for patterning process quality assessment and monitoring. Besides feature width and feature-feature space dimension measurements from critical dimension SEM (CDSEM) images, visual inspection of SEM image also offers rich information on the quality of patterning. However, visual inspection alone leaves considerable room of ambiguity regarding patterning quality. To narrow the room of ambiguity and to obtain more statistically quantitative information on patterning quality, SEM-image contours are often extracted to serve such purposes. From contours, important information such as critical dimension and resist sidewall angle at any location can be estimated. Those geometrical information can be used for optical proximity correction (OPC) model verification and lithography hotspot detection, etc. Classical contour extraction algorithms based on local information have insufficient capability in dealing with noisy and low contrast images. To achieve reliable contours from noisy and low contrast images, information beyond local should be made use of as much as possible. In this regard, deep convolutional neural network (DCNN) has proven its great capability, as manifested in various computer vision tasks. Taking the full advantages of this maturing technology, we have designed a DCNN network and applied it to the task of extracting contours from noisy and low contrast SEM images. It turns out that the model is capable of separating the resist top and bottom contours reliably. In addition, the model does not generate false contours, it also can suppress the generation of broken contours when ambiguous area for contour extraction is small and non-detrimental. With advanced image alignment algorithm with sub-pixel accuracy, contours from different exposure fields of same process condition can be superposed to estimate process variation band, furthermore, stochastic effect induced edge placement variation statistics can easily be inferred from the extracted contours.

A Light-Weight Convolutional Neural Network for Super-Resolving SEM Images to Enhance Real-Time Micro-Nano Manipulation

Lightweight Attention-Guided Network for Image Super-Resolution

Lightweight Image Super-Resolution Network Using 3D Convolutional Neural Networks

An Adversarial Learning Approach for Super-Resolution Enhancement Based on AgCl@Ag Nanoparticles in Scanning Electron Microscopy Images.

Deep Learning for Super-Resolution in a Field Emission Scanning Electron Microscope

Deep Learning Super-Resolution Electron Microscopy Based on Deep Residual Attention Network

Lightweight Multiresolution Feature Fusion Network for Spectral Super-Resolution

Lightweight Super-Resolution Using Deep Neural Learning

SMC-SRGAN-Lightning super-resolution algorithm based on optical micro-scanning thermal microscope image

SRFS:Super Resolution in Fast-Slow Scanning Mode of SEM Based on Denoising Diffusion Probability Model

Resolution enhancement in scanning electron microscopy using deep learning

SRFS: Super Resolution in Fast-Slow Scanning Mode of SEM Based on Denoising Diffusion Probability Model

Resolution Enhancement of Scanning Electron Micrographs using Artificial Intelligence

Deep Learning Enables Large Depth-of-Field Images for Sub-Diffraction-Limit Scanning Superlens Microscopy

Semantic-Aware Guided Low-Light Image Super-Resolution

Efficient Self-Calibrated and Hierarchical Refinement Network for Lightweight Super-Resolution

LIGHTWEIGHT NON-LOCAL NETWORK FOR IMAGE SUPER-RESOLUTION

Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

Enhancing Neural Segmentation on Low-Quality SEM Images Using Self-Attention Based Fusion Module with Auxiliary Deblurring Network

Lightweight Image Super-Resolution with Expectation-Maximization Attention Mechanism

SEM-DCNet: A Self-Supervised Network for SEM Images Zonary Non-Linear Distortion Correction