Te Nanomesh/black‐si Van Der Waals Heterostructure for High‐Performance Photodetector

Yiyang Wei,Changyong Lan,Ji Zeng,You Meng,Shuren Zhou,Senpo Yip,Chun Li,Yi Yin,Johnny C. Ho
DOI: https://doi.org/10.1002/adom.202400056
IF: 9
2024-01-01
Advanced Optical Materials
Abstract:Van der Waals (vdW) heterostructures have gained significant attention in photodetectors due to their seamless integration with materials possessing diverse functionalities. In this study, the fabrication of a Te nanomesh/black-Si vdW heterostructure is presented, and investigated its photoresponse properties. The heterostructure exhibits a pronounced rectification behavior, characterized by a rectification ratio of 2.2 x 104. Notably, the heterostructure device demonstrates commendable photoresponse properties, including a high responsivity of 350 mA W-1, an extensive linear dynamic range of 45.5 dB, a high specific detectivity of 9.6 x 1011 Jones, and a wide spectral response ranging from 400 to 1550 nm. Furthermore, the heterostructure exhibits rapid response, with a rise time and a decay time of 70 and 140 mu s, respectively. These exceptional photoresponse properties can be attributed to the robust internal built-in electrical field at the hetero-interface and the augmented light absorption in black-Si. The outstanding photoresponse properties of the heterostructure make it a promising candidate for multiwavelength single-pixel imaging, enabling the collection of mask patterns under varying wavelengths of light radiation. This work provides a novel approach for fabricating mixed-dimensional vdW heterostructures, offering promising prospects for advancements in optoelectronics. Te nanomesh/black-Si heterostructure photodiode is fabricated by direct physical vapor deposition of Te nanomesh on black-Si. The heterostructure photodiode exhibits superior photodetection performance, including broadband spectral response, large linear dynamic range, large specific detectivity, and fast response speed. image
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