Artificial Domain Patterning in Ultrathin Ferroelectric Films Via Modifying the Surface Electrostatic Boundary Conditions.

Wei Li,Lei Liao,Chenguang Deng,Collieus Lebudi,Jingchun Liu,Sixu Wang,Di Yi,Lifen Wang,Jing-Feng Li,Qian Li
DOI: https://doi.org/10.1021/acs.nanolett.4c00479
IF: 10.8
2024-01-01
Nano Letters
Abstract:Nanoscale spatially controlled modulation of the properties of ferroelectrics via artificial domain pattering is crucial to their emerging optoelectronics applications. New patterning strategies to achieve high precision and efficiency and to link the resultant domain structures with device functionalities are being sought. Here, we present an epitaxial heterostructure of SrRuO3/PbTiO3/SrRuO3, wherein the domain configuration is delicately determined by the charge screening conditions in the SrRuO3 layer and the substrate strains. Chemical etching of the top SrRuO3 layer leads to a transition from in-plane a domains to out-of-plane c domains, accompanied by a giant (>105) modification in the second harmonic generation response. The modulation effect, coupled with the plasmonic resonance effect from SrRuO3, enables a highly flexible design of nonlinear optical devices, as demonstrated by a simulated split-ring resonator metasurface. This domain patterning strategy may be extended to more thin-film ferroelectric systems with domain stabilities amenable to electrostatic boundary conditions.
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