Atomically Precise Bottom‐Up Fabrication of Ultra‐Narrow Semiconducting Zigzag BiP Nanoribbons

Dechun Zhou,Yisui Feng,Lei Zhang,Wenjin Gao,Heping Li,Hui Li,Miao Zhou,Tianchao Niu
DOI: https://doi.org/10.1002/adfm.202401347
IF: 19
2024-01-01
Advanced Functional Materials
Abstract:1D semiconductors with atomically precise edge and well-controlled width hold significant promise as channel materials for next-generation electronics. Here a method to fabricate the narrowest zigzag-edged bismuth phosphide (BiP) nanoribbons (NRs) is presented, achieving widths of three atoms (approximate to 0.7 nm), through molecular beam epitaxy on bismuthene in a wide P coverage range. Using scanning tunneling microscopy and first-principles calculations, it is revealed that these BiP NRs exhibit a blue-phosphorene-like structure, with a theoretical bandgap of 0.38 eV. Notably, first-principles calculations reveal spin-polarized states located on the zigzag edges, presenting an option for spintronics applications. Formation of these uniform BiP NRs is attributed to tensile strain from lattice-registry confinement. During epitaxial growth, P clusters act dually as feedstock and catalysts, suggesting a self-catalyzed growth mechanism. The bottom-up strategy offers an effective approach for the atomically precise fabrication of 1D BiP NRs, paving the way for the creation of diverse low-dimensional binary materials with tailored chemical and electronic properties, facilitated by selecting suitable elemental 2D materials as substrates. The narrowest zigzag-edged BiP nanoribbons are fabricated by MBE on beta-bismuthene. STM complemented with DFT calculation reveals a blue-phosphorene-like structure with three atoms wide, which exhibits spin-polarized states located on the zigzag edges. P clusters serve both as a feedstock and catalyst, indicating a self-catalyzed mode. image
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