Abstract:It is known that in very-high-frequency capacitively coupled plasmas (VHF CCPs), the higher harmonics generated by nonlinear sheath motion can enhance the standing wave effect (SWE), which can lead to center-peaked plasma density profiles. In this work, an improved nonlinear electromagnetic model incorporating a transmission line model, an electron momentum balance model, a bulk plasma model, a collisionless nonlinear numerical sheath model, and an ion Monte-Carlo collision (MCC) model is developed to study the effects of low-frequency (LF) voltage VL on the nonlinear standing wave excitation, plasma uniformity, and ion energy and angular distribution functions (IEDFs and IADFs) in dual-frequency (DF) asymmetric capacitive argon discharges at relatively low pressure of 3 Pa. The plasma diffusion in the radial direction and ion dynamics within the LF oscillating sheath are self-consistently considered. The LF voltage VL at 2 MHz varies from 0 to 700 V while the high-frequency (HF) voltage VH at 60 MHz is fixed at 100 V. Simulation results indicate that without the addition of an LF source (i.e. VL = 0 V), there are a considerable number of high-order harmonics with short wavelengths, leading to significant SWE and central peak in the radial plasma density profile. Nevertheless, the high-order harmonic excitations tend to be weakened and merely occur around the phase of the full LF sheath collapse due to a shorter characteristic damping time of the surface waves as VL increases. This, combined with increased surface wavelengths of both the driving frequency and the higher harmonics at a higher VL, leads to suppressed standing waves and improved plasma uniformity. Meanwhile, the simulations show that both the low and the high energy peaks of IEDF move towards higher energies, and the energy peak separation width ΔE becomes wider with the increase of VL. The IEDF at the radial center of the powered electrode exhibits a broader ΔE than that at the edge. For the IADF, an increased VL results in more ions incident on the electrode with a smaller deflection angle. Because of a thinner sheath and a higher sheath voltage at the electrode center, the peak value of IADF at the electrode center is greater than that at the edge.

Electron Power Absorption in CF4 Capacitively Coupled RF Plasmas Operated in the Striation Mode

Frequency-dependent electron power absorption mode transitions in capacitively coupled argon-oxygen plasmas

Numerical characterization of capacitively coupled CF 4 plasmas modulated by anion beam injection

Ionization by bulk heating of electrons in capacitive radio frequency atmospheric pressure microplasmas

The effect of ambipolar electric fields on the electron heating in capacitive RF plasmas

Controlling the Density of Plasma Species in Ar/CF4 Radiofrequency Capacitively Coupled Plasma Discharges

Particle-in-cell simulation of a 50~mTorr capacitively coupled argon discharge over a range of frequencies

Hybrid simulation of instabilities in capacitively coupled RF CF 4 /Ar plasmas driven by a dual frequency source

Electron Density and Ion Energy Dependence on Driving Frequency in Capacitively Coupled Argon Plasmas

Diagnosis of electron density and temperature by using collisional radiative model in capacitively coupled Ar plasmas II: two-dimensional distributions

The dynamical behavior of the capacitively coupled argon plasma driven by very high frequency

Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges

Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target

Fluid models calculation of Ar/CF 4 radiofrequency capacitively coupled plasmas

An experimental and computational study on the ignition process of a pulse modulated dual-RF capacitively coupled plasma operated at various low-frequency voltage amplitudes

Effects of low-frequency voltage on nonlinear standing wave excitation, plasma uniformity, and ion dynamics in dual-frequency asymmetric capacitive discharges

Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas

Electron heating and control of ion properties in capacitive discharges driven by customized voltage waveforms

On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge

Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source