Abstract:The combination of advanced functional materials with high optical performance and cutting-edge micro/nano fabrication technology has ushered in a new era for integrated photonics. Thin-film lithium niobate (TFLN) has emerged as a promising material platform for the next generation photonic integrated circuits (PICs), owing to its wide transparency window from UV to mid-IR, moderately high refractive index that enables dense photonic integration while maintaining a suitable mode-size in the single-mode lithium niobate (LN) ridge waveguide, and large electro-optic (EO) as well as nonlinear optical coefficients which are critical for high-speed EO tuning and high-efficiency wavelength conversion applications. Photolithography assisted chemo-mechanical etching (PLACE), a technique developed specifically for fabricating high quality (high-Q) large-scale PICs on TFLN, has enabled fabrication of a series of building blocks of PICs ranging from high-Q micro-resonators and low-loss waveguides to waveguide amplifiers, arrayed waveguide grating (AWG) and electro optically tunable/programmable photonic circuits, showing high optical performance, such as, 1.2 x 108-ultra-high-Q micro-resonator, 0.025-dB/cm ultra-low-loss continuously tunable delay line, 20-dB gain waveguide amplifier and 1.5-mW total power consumption matrix operation devices. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high repetition-rate femtosecond laser and a high-speed polygon laser scanner, achieving infinite field of vision (IFOV) processing, by which a lithography fabrication efficiency of 4.8 cm(2)/h has been achieved at a spatial resolution of 200 nm. Using the high-speed femtosecond laser lithography system, we successfully fabricate photonic structures of large footprints with reasonable propagation loss. By combining the previous femtosecond scan scheme for smoothing mask edges with a high-speed polygon scan scheme for patterning the waveguide groove part, we further improve the propagation loss. We also demonstrate wafer-scale fabrication of microelectrode structures, showing high uniformity in the fabrication process, and high-speed Mach-Zehnder interferometer (MZI) modulators. By characterizing EO performance of the MZI modulator, we achieve a voltage-length product of 1.86 V cm and a measured 3-dB bandwidth up to 70 GHz. With the continuous advances in the high-repetition-rate femtosecond laser, high-speed electronic shutter/ controller and high-speed host data transmission technology, we expect the fabrication efficiency and propagation loss can be further promoted by 1-2 orders of magnitude. This will have a profound implication as miniaturization will play a central role in future society.

Advancements in Ultrafast-Laser-Inducing Micro-Nanophotonic Structures Inside Lithium Niobate(Invited)

Strong Nonlinear Optics In On-Chip Lithium Niobate Photonic Molecules Fabricated By Femtosecond Laser

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Advancing Integrated Photonics and Microreactor Technologies with Ultrafast Laser Processing

Strong Nonlinear Optics In On-Chip Coupled Lithium Niobate Microdisk Photonic Molecules

Ultrahigh quality-factor microresonators fabricated in pristine lithium niobate thin film for efficient nonlinear optics applications

Recent development in integrated Lithium niobate photonics

Microstructure and Domain Engineering of Lithium Niobate Crystal Films for Integrated Photonic Applications

Recent Advances in Femtosecond Laser Processing of LiNbO3Crystals for Photonic Applications

Recent Progress in Thin-Film Lithium Niobate Photonic Crystal [Invited]

Ultrafast tunable lasers using lithium niobate integrated photonics

Femtosecond Laser Processing of Lithium Niobate Crystal: Principle and Applications

Progress on Ultrafast Laser Lithography of Large-Scale Lithium Niobate Integrated Photonics

Ion-cut Lithium Niobate on Insulator Technology: Recent Advances and Perspectives

Femtosecond laser writing of lithium niobate ferroelectric nanodomains

Perspective on Lithium-Niobate-on-Insulator Photonics Utilizing the Electro-optic and Acousto-optic Effects

Polarization sensitive microstructures fabricated on lithium niobate surfaces by using femtosecond laser pulses

Research Progress in Lithium Niobate on Insulator Lasers

Investigation of femtosecond laser assisted nano and microscale modifications in lithium niobate

Ultrafast Multistage Lattice Strain Via Laser‐Excited Phonons in Lithium Niobate

Advances in Lithium Niobate Thin-Film Lasers and Amplifiers: a Review