Probing of coupling effect induced plasmonic charge accumulation for water oxidation
Yuying Gao,Feng Cheng,Weina Fang,Xiaoguo Liu,Shengyang Wang,Wei Nie,Ruotian Chen,Sheng Ye,Jian Zhu,Hongyu An,Chunhai Fan,Fengtao Fan,Can Li
DOI: https://doi.org/10.1093/nsr/nwaa151
IF: 20.6
2020-07-06
National Science Review
Abstract:Abstract A key issue for redox reactions in plasmon-induced photocatalysis, particularly for water oxidation, is the concentration of surface-accumulating charges (electrons or holes) at a reaction site for artificial photosynthesis. However, where plasmonic charge accumulated at a catalyst's surface, and how to improve local charge density at active sites, remains unknown because it is difficult to identify the exact spatial location and local density of the plasmon-induced charge, particularly with regard to holes. Herein, we show that at the single particle level, plasmon-coupling-induced holes can be greatly accumulated at the plasmonic Au nanoparticle dimer/TiO2 interface in the nanogap region, as directly evidenced by the locally enhanced surface photovoltage. Such an accumulation of plasmonic holes can significantly accelerate the water oxidation reaction (multi-holes involved) at the interfacial reaction site, with nearly one order of magnitude enhancement in photocatalytic activities compared to those of highly dispersed Au nanoparticles on TiO2. Combining Kelvin probe force microscopy and theoretical simulation, we further clarified that the local accumulated hole density is proportional to the square of the local near-field enhancement. Our findings advance the understanding of how charges spatially distribute in plasmonic systems and the specific role that local charge density at reaction sites plays in plasmonic photocatalysis.
multidisciplinary sciences