Compound Processing Effects of HVEF and Low Energy N~+ Ion on Streptomyces Aureofaciens

Le Shi
2014-01-01
Abstract:The correlation among survivor,mutation rate and dose( or influence) had been studied in low energy nitrogen ion beam implantation and HVEF treatment on Streptomyces Aureofaciens. Then the optimum treatment doses were determined: low-energy ion implantation of 1. 82 × 1015ions·cm- 2dose and 2. 86 × 1015ions·cm- 2dose at 10kev and HVEF doses of 20s × 0. 5kv·cm- 1、60s ×2kv·cm- 1. With the optimization of HVEF doses and nitrogen ion doses to composite treatment on S. Aureofaciens,the result show that the positive mutation rates by composite treatment of some dose are much higher than that of single treatment of N+ion at the same dose. The activities of POD,SOD,CAT were investigated at the high-yield strains M226 and D1114 and the original strain SL2( CK). The changes of POD,SOD, CAT activities were significantly different among the three strains. : D1114、M226,and CK. that the three enzymes played important roles in induced mutations and the effects of complex treatment of HVEF and N+ion were more significantly than that of N+ion single treatment.
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