DESIGN OF UNDULATOR FOR THE SHANGHAI DUV-FEL

Qika Jia,Shancai Zhang,Shengkuan Lu,Duohui He,Yaqiang Cao,Zhimin Dai,Zhentang Zhao
2004-01-01
Abstract:The design study of the undu1ator for Shanghai deep ultra violate free electron laser source (SDUV-FEL) is presented. The optimum undulator parameters for the FEL performance have been studied. The scheme of focusing and segmentation is discussed. The requirements of undulator magnet field and main technical demand are given.
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