Abstract:Electronic nematicity that spontaneously breaks rotational symmetry has been shown as a generic phenomenon in correlated quantum systems including high-temperature superconductors and the AV3Sb5 (A = K, Rb, Cs) family with a kagome network. Identifying the driving force has been a central challenge for understanding nematicity. In iron-based superconductors, the problem is complicated because the spin, orbital and lattice degrees of freedom are intimately coupled. In vanadium-based kagome superconductors AV3Sb5, the electronic nematicity exhibits an intriguing entanglement with the charge density wave order (CDW), making understanding its origin difficult. Recently, a new family of titanium-based kagome superconductors ATi3Bi5 has been synthesized. In sharp contrast to its vanadium-based counterpart, the electronic nematicity occurs in the absence of CDW. ATi3Bi5 provides a new window to explore the mechanism of electronic nematicity and its interplay with the orbital degree of freedom. Here, we combine polarization-dependent angle-resolved photoemission spectroscopy with density functional theory to directly reveal the band topology and orbital characters of the multi-orbital RbTi3Bi5. The promising coexistence of flat bands, type-II Dirac nodal line and nontrivial Z2 topological states is identified in RbTi3Bi5. Remarkably, our study clearly unveils the orbital character change along the G-M and G-K directions, implying a strong intrinsic inter-orbital coupling in the Ti-based kagome metals, reminiscent of iron-based superconductors. Furthermore, doping-dependent measurements directly uncover the orbital-selective features in the kagome bands, which can be well explained by the d-p hybridization. The suggested d-p hybridization, in collaboration with the inter-orbital coupling, could account for the electronic nematicity in ATi3Bi5.

Erratum: Flat Band and ℤ<sub>2</sub> Topology of Kagome Metal CsTi<sub>3</sub>Bi<sub>5</sub> [Chin. Phys. Lett. 40, 037102 (2023)]

Erratum: Flat Band and $\mathbb{Z}$<sub> <i>2</i> </sub> Topology of Kagome Metal CsTi<sub>3</sub>Bi<sub>5</sub>

Flat Band and DOUBLE-STRUCK CAPITAL Z(2) Topology of Kagome Metal CsTi3Bi5

Flat Band and Z2 Topology of Kagome Metal CsTi3Bi5

Flat Band and DOUBLE-STRUCK CAPITAL Z<sub>2</sub> Topology of Kagome Metal CsTi<sub>3</sub>Bi<sub>5</sub>

Erratum: Topological Band Evolution Between Lieb and Kagome Lattices [phys. Rev. B 99, 125131 (2019)]

Observation of flat band, Dirac nodal lines and topological surface states in Kagome superconductor CsTi3Bi5

Correction: Corrigendum: Artificial Gauge Field and Topological Phase in a Conventional Two-dimensional Electron Gas with Antidot Lattices

Flat bands, non-trivial band topology and electronic nematicity in layered kagome-lattice RbTi$_3$Bi$_5$

Observation of multiple flat bands and topological Dirac states in a new titanium based slightly distorted kagome metal YbTi3Bi4

Erratum: Weyl Semimetal Phase in the Non-Centrosymmetric Compound TaAs

Flat bands, non-trivial band topology and rotation symmetry breaking in layered kagome-lattice RbTi 3 Bi 5

Tunable Van Hove Singularity Without Structural Instability in Kagome Metal CsTi3Bi5

Topological electronic structure and electronic nematicity in candidate kagome superconductors, ATi$_{3}$Bi$_{5}$ (A = Rb, Cs)

Non-trivial band topology and orbital-selective electronic nematicity in a titanium-based kagome superconductor

Non-trivial band topology and orbital-selective electronic nematicity in a new titanium-based kagome superconductor

Topological electronic structure and electronic nematicity in candidate kagome superconductors, ATi3Bi5 (A = Rb, Cs)

Physical properties, electronic structure, and strain-tuned monolayer of the weak topological insulator RbTi3Bi5 with Kagome lattice

Superconductivity and orbital-selective nematic order in a new titanium-based kagome metal CsTi3Bi5

Erratum: Computational and experimental investigation of TmAgTe2 and: XYZ 2 compounds, a new group of thermoelectric materials identified by first-principles high-throughput screening (Journal of Materials Chemistry C (2015) 3 (10554-10565))