Introduction to the Special Issue on Machine Learning for CAD/EDA

Yibo Lin,Avi Ziv,Haoxing Ren
DOI: https://doi.org/10.1145/3586208
IF: 1.447
2023-01-01
ACM Transactions on Design Automation of Electronic Systems
Abstract:Recent advances in machine learning (ML) have brought revolutions for a variety of applications like computer vision, recommendation systems, and robotics. Many researches have been exploring the applications of ML to CAD/EDA problems. However, the design processes in the CAD flow present challenges to achieve high accuracy, generality, and efficiency. Compared to traditional ML applications such as computer vision, parallel advances in ML and CAD are often required to achieve effectiveness in the design processes. This special issue on Machine Learning for CAD/EDA focuses on concepts and methods for applying machine learning techniques to improve design performance and speed up design closure in the CAD flow. The idea for this special issue originated at a workshop on “Machine Learning for CAD (MLCAD)” held in 2021. In response to our call for papers released in early 2021, we received 22 submissions, of which 17 were selected for an accelerated review and revision process. This special issue collects the final 13 accepted articles covering a wide range of topics at various perspectives in the CAD flow, including surveys on ML for CAD applications, ML for analog design optimization, ML for digital design optimization, and ML for design analysis. The articles presented in this special issue are aimed at providing a systematic perspective beyond a single isolated domain to stimulate discussion and development of innovative ML approaches in CAD applications. The articles in the special issue fall into four categories. Category MLCAD Surveys contains two articles.
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