STUDY ON THE EFFECT OF PLASMA ETCHING ON THE\=BINDING PERFORMANCE OF THE DIAMOND FILM

Kesong Zhou,Tongchun Kuang
1999-01-01
Abstract:A special pre\|treatment technology, that is, the effect of Ar\|H\-2 plasma etching on the binding performance of the diamond film with the cemented carbide substrate is studied. Results show that the Ar\|H\-2 plasma etching can obviously rough the surface of the substrate, change the chemical composition of the surface and form a pure tungsten la\|yer. When the tungsten layer is recarbonized in the subsequent technical process, the bin\|ding strength between the diamond film and the substrate can be obviously improved.
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