The Simulation Analysis for Photolithography Process of Microlens Array

Bin Chen

2003-01-01

Abstract:The model of microlens photolithography process has been established.By computer simulation,we not only acquired the relation of the process parameter but also provided the stan-dard for parameter selection.It is important to the process of photolithography.

What problem does this paper attempt to address?

Simulation and Experimental Investigation of Immersion Flow Field in Immersion Lithography

FU Xin,ZHAO Jinyu,CHEN Hui,CHEN Wenyu

DOI: https://doi.org/10.3901/jme.2011.02.189

2011-01-01

Abstract:Immersion lithography is the only actual applied technology for up to 45-mm IC production line.The high refractive index liquid filled between the last one projective lens and wafer is used to improve the optical resolution of the immersion lithography,but the photoresist leaching and liquid heating can occur during immersion exposure process.The liquid renovation must be considered in the immersion lithography because of its ability of pollution elimination and heat dispersion.A CFD model is established to study the influence of structural parameters on the updating efficiency of immersion flow field.The visual flow field test system composed of high-speed camera and data acquisition instrument is used to carry out the research of visualization of immersion flow field,and which is compared with the simulation result,thereby a set of optimized parameters of injection and recovery ports is obtained.
Simulation for Effect of Process Parameters on Surface Profile in Thick Film Photolithography

Xionggui Tang,Heping Li,Jingkun Liao,Yongzhi Liu,Yongkang Guo

DOI: https://doi.org/10.1117/12.782692

2007-01-01

Abstract:The microstructure with high fidelity is very important while being used as micro-optical component, because the performance tightly depends on the profile quality of microstructure. Optical lithography method based on thick film resist plays an increasing important role in fabrication for microstructure. However, the profile quality of the microstructure is greatly affected by process parameters adopted in the experiment. In this paper, the effect of illumination wavelength, gap distance and absorption coefficient on the profile quality after development has been simulated, analyzed and discussed in detail, by using the model for thick film lithography. The simulated results show that these process parameters have a great impact on the profile quality of microstructures, which it is helpful for process optimization and profile control of thick film photolithography.
Simulation of Solidification Process of Micro Stereo Photolithography

王翔,赵钢,邬昶畅,李川奇,沈连官,初昶波

DOI: https://doi.org/10.3969/j.issn.1672-1616.2002.06.035

2002-01-01

Abstract:The possibility of design can be improved by using micro stereo photolithography in manufacture of micro-machine structure. Delaminating 3D entity model, 2D graphic characters was gotten, then CNC codes could be generated with contour scanning and raster scanning. By OpenGL and Microsoft Visual C++, it realized the simulation of 2D plane solidification process and 3D superposition process. Based on this, the validity of data processing and manufacturing parameters setting could be checked. This method was used in our micro stereo photolithography system.
Simulation Of Imaging And Refocusing For Light Field Photography

Han Huang,Xiaotong Li,Zhaofeng Cen

DOI: https://doi.org/10.1117/12.2037128

2013-01-01

Abstract:The entire process of image formation and refocusing of light field photography with microlens array is simulated using the in-house software OTS based on real ray tracing. The optical system consists of a photographic lens and the microlens array which are specifically designed. Objects are placed in different distance before the lens, and images of them on the detector plane are got by imaging simulation algorithm. Utilizing the color, intensity and the corresponding direction information of light rays on the image plane, pictures focusing at different depth in the image space are calculated, so that we can refocus at different objects in different distance. The paper also details the basic requirement of optical system and this simulation process is a fundamental work of research on design method and performance of lens using in light field photography.
Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Guoxu Yu,Yuan Ma,Xuan Li,Bowen Yu,Xinping Zhang,Xuanhe Zhang,Yiqing Chen,Zhenwei Liang,Zuobo Pang,Ding Weng,Lei Chen,Jiadao Wang

DOI: https://doi.org/10.1021/acs.langmuir.3c01643

IF: 3.9

2023-09-25

Langmuir

Abstract:Micro/nanospherical lens photolithography (SLPL) constitutes an efficient and precise micro/nanofabrication methodology. It offers advantages over traditional nanolithography approaches, such as cost-effectiveness and ease of implementation. By using micrometer-sized microspheres, SLPL enables the preparation of subwavelength scale features. This technique has gained attention due to its potential applications. However, the SLPL process has a notable limitation in that it mostly produces simple pattern shapes, mainly consisting of circular arrays. There has been a lack of theoretical analysis regarding the possible shapes that can be created. In our experiments, we successfully prepared annular and ring-with-hole pattern shapes. To address this limitation, we applied the Mie scattering theory to systematically analyze and summarize the various patterns that can be obtained through the SLPL process. We also proposed methods to predict and obtain different patterns. This theoretical analysis enhances the understanding of SLPL and expands its potential applications, making it a valuable area for further research.

chemistry, multidisciplinary, physical,materials science
Characterization of process and machine dynamics on the precision replication of microlens arrays using microinjection moulding

Hao-Yang Zhang,Nan Zhang,Wei Han,Hong-Gang Zhang,Michael D. Gilchrist,Feng-Zhou Fang

DOI: https://doi.org/10.1007/s40436-020-00341-y

IF: 3.837

2021-03-01

Advances in Manufacturing

Abstract:Injection moulding has shown its advantages and prevalence in the production of plastic optical components, the performance and functionality of which rely on the precision replication of surface forms and on minimizing residual stress. The present work constitutes a systematic and comprehensive analysis of practical microlens arrays that are designed for light-field applications. Process parameters are screened and optimized using a two-stage design of experiments approach. Based on in-line process monitoring and a quantitative and qualitative evaluation being carried out in terms of geometric accuracy, surface quality and stress birefringence, the replication is shown to relate directly to machine settings and dynamic machine responses. The geometric accuracy and stress birefringence are both largely associated with screw displacement and peak cavity pressure during the packing stage, while surface quality is closely related to cavity temperature. This study provides important insights and recommendations regarding the overall replication quality of microlens arrays, while advanced injection moulding solutions may be necessary to further improve the general replication quality.

engineering, manufacturing,materials science, multidisciplinary
Simulation Of The Velocity Distribution For Immersion Lithography

Chen Hui,Wenyu Chen,Zou Jun,Xiaodong Ruan,Fu Xin

DOI: https://doi.org/10.1109/AIM.2009.5229846

2009-01-01

Abstract:Immersion lithography has been accepted as a method for improving optical lithography resolution to 45 nm, and allows improved resolution without a large shift in infrastructure. The premise behind the concept is to increase the refraction index in the space between the lens and resist-coated wafer by insertion of a high refractive index liquid in place of the low refractive index air that currently fills the gap, and the liquid must maintain a high uniform optical quality. However, the immersion liquid within the gap has to be updated as substances such as photo acid generators (PACs) and bubbles, may affect the optical quality of the liquid. The efficiency of the contaminant elimination mainly depends on flow conditions, especially velocity distribution of flow field under lens region.Three-dimensional (3-D) computational fluid dynamics (CFD) models of the fluid between the lens and wafer are developed using the software Fluent and used to investigate the velocity distribution between the lens and wafer, considering fluid injection pressure, dispense ports quantity and wafer scanning velocities. Moreover, the numerical results are compared with experimental results.
Design and Simulation for the Bifocal Microlens in Thick Film Lithography

Xionggui Tang,Rongguo Lu,Jinkun Liao,Heping Li,Lin Zhang,Yongzhi Liu

DOI: https://doi.org/10.1117/12.865995

2010-01-01

Abstract:The bifocal microlens are novel optical components, which have the capability of producing two focal points along optical axis. They have potential application in readout of dual-layer disks, optical tweezer, optical coherence tomography and microfluidic system. In this paper, the design for the bifocal microlens has been presented. The distortion of the pattern transfer process in the thick film lithography has been analyzed. The modified grayscale mask method has been introduced to compensate the distortion of the pattern transfer process. The simulation for fabrication of the bifocal microlens in the thick film lithography has been performed, which shows that the simulated profile is closely consistent with the designed one. Through our proposed method, the bifocal microlens with high profile quality can be obtained, and consequently this can greatly improve its optical performance. Furthermore, the fabrication process is relatively easy and the cost is low, which is favorable to the future application of the bifocal microlens.
SIMULATING PRESSURE DISTRIBUTION ON LENS RELEVANT TO FLUID INJECTION FOR IMMERSION LITHOGRAPHY

Wenyu Chen,Xin Fu,Huayong Yang

DOI: https://doi.org/10.5739/isfp.2008.847

2008-01-01

Proceedings of the JFPS International Symposium on Fluid Power

Abstract:Immersion lithography has been proposed as a method for improving optical lithography resolution to 32nm. The premise behind the concept is to increase the refraction index in the space between the lens and wafer by insertion of a high refractive index liquid in place of the low refractive index air that currently fills the gap. During the scanning and exposure process, immersion liquid is injected into the space between wafer and lens with certain inlet pressure and angle. Because the liquid will act as a lens component during the lithographic process, it must maintain high uniform optical quality. One source of optical degradation may be due to lens distortion caused by the pressure distribution nonuniformity in the fluid flow field. Consequently, any deviations of pressure distribution on flow field boundary in direct contact with lens may damage the uniform optical path.Three-dimensional computational fluid dynamics models were created to assess the pressure distribution characteristics relevant to flow rates and injecting angles of immersion liquid. Flow field stream patterns were discussed corresponding to dispense port numbers. The numerical simulation results were presented, featuring lens normal and shear pressure and injection flow, considering fluid injecting velocity, dispense ports quantity, and direction angles.
Study on the Surface Topography Changes of Photoresist in the Design and Fabrication of Microlens Array

Dan Liu,Liying Wu,Min Liu,Di Zhang,Minni Qu,Liucheng Fu,Xiulan Cheng

DOI: https://doi.org/10.1117/1.oe.63.3.034105

IF: 1.3

2024-01-01

Optical Engineering

Abstract:The fabrication method of microlens arrays with diameters from 20 to 90 mu m based on thermal reflow and dry etch structure transition process is demonstrated. The key process parameters of microlens design and production are obtained by theoretical calculation. And the research of photoresist (AZ4330) surface topography changes during thermal reflow process is studied in detail, which is helpful for microlens array design and process optimization. The photoresist microlens arrays are transferred into quartz by dry etching process. The measurement data indicate that the photoresist microlens arrays have good surface topography and high surface quality, and the optical property of quartz microlens is in good agreement with the theoretical design. This method can be widely used to prepare high quality microlens arrays in optical applications.
Simulation and pattern distortion analysis of UV-LIGA based on the partial coherent light theory

Li, Mujun,Shen, Lianguan,Zheng, Jinjin,Wei Zhao,Liting Liu

DOI: https://doi.org/10.1109/ICINFA.2008.4608242

2008-01-01

Abstract:Structural accuracy is one of the most concerned issues in micro fabrication, for its significant impact on the system performance. In this paper, the pattern transfer accuracy in proximity UV-lithography is investigated according to the partial coherent light theory. Based on the complex degree of coherence for any two points on the mask plane, a mathematical model is constructed to analyze the propagation of mutual intensity from the mask to the internal photo-resist. The intensity distribution is calculated subsequently. And with the aerial image distribution, the 3D photo-resist profile is simulated. Then shape distortion is characterized, especially on the edge, the corner, and the sidewall angle of the profile. The theoretical model has given an effective way for the error analysis, and the experimental results have evaluated the theoretical simulation and revealed the validity of the method.
Litholab: a new environment for micro-lithography modeling

Ye Chen,Zheng Shi,Ke Zhou,Yue Ma

DOI: https://doi.org/10.1109/ICSICT.2006.306234

2006-01-01

Abstract:With minimum feature sizing down, more advanced configurations are used in micro-lithographic systems. It is harder than before to build an accurate lithography model. In this paper, a new micro-lithography modeling environment is introduced, which provides a set of handy tools to easily customize and build models for micro-lithographic system with advanced configurations. The ability and structure of the environment are described in detail. Examples show the efficiency and accuracy of the environment
Optimization of Solidification Process Parameters in Micro Stereo Lithography

WANG Xiang,ZHAO Gang,MA De-sheng,HUANG Wen-hao

DOI: https://doi.org/10.3321/j.issn:1004-924x.2007.04.003

2007-01-01

Optics and Precision Engineering

Abstract:For analysis on the effect of process parameters on the shape and precision of solidification in photosensitive resin solidification with UV light exposing, the main solidification process parameters are analyzed and optimized based on the experiment data got by self-made equipment.The high precision solidified line is abtained in the thickness of a single layer of liquid resin of 30 μm,the exposing power of 0.15 μW,the scanning speed of 15 μm/s and the working length between objective lens and surface of resin of 650 μm. With the optimized process parameters,3D micro structures are manufactured successfully.
Simulation of Light-Field Camera Imaging Based on Ray Splitting Monte Carlo Method

Bin Liu,Yuan,Sai Li,Yong Shuai,He-Ping Tan

DOI: https://doi.org/10.1016/j.optcom.2015.06.020

IF: 2.4

2015-01-01

Optics Communications

Abstract:As microlens technology matures, studies of structural design and reconstruction algorithm optimization for light-field cameras are increasing. However, few of these studies address numerical physical simulation of the camera, and it is difficult to track lighting technology for forward simulations because of its low efficiency. In this paper, we develop a Monte Carlo method (MCM) based on ray splitting and build a physical model of a light-field camera with a microlens array to simulate its imaging and refocusing processes. The model enables simulation of different imaging modalities, and will be useful for camera structural design and error analysis system construction.
A Simple Method for Shape Modulation in Microlens Array Fabrication Via Spin-Coating Process

Shengzhou Huang,Mujun Li,Lianguan Shen,Jinfeng Qiu,Youquan Zhou

DOI: https://doi.org/10.1007/s00542-017-3571-x

2017-01-01

Microsystem Technologies

Abstract:In this paper, a simple method for microlens array (MLA) fabrication is presented by the modulation of spin-coating process. Firstly, micro holes with design diameters were prepared on substrate through maskless lithography based on the digital micromirror device. Next by the spin-coating of photoresist onto the substrate the meniscus concave microlens with various curvatures can be formed, and then become stable after a proper baking process. During the coating process, the photoresist was strictly confined in the micro holes and its volume could be precisely controlled by adjusting the spin-coating speed. These advantages make it very easy to obtain microlenses with different aspect ratios at precisely pre-defined diameters. Experimental results showed the effectiveness of our method. The presented method is expected to provide a novel, economic and simple strategy for shape modulation in MLA fabrication.
Model analysis of effect of diffraction focus characteristics of microlens arrays on parallel laser direct writing quality

Jiubin Tan,Mingguang Shan,Jian Liu,Hui Zhang,Chenguang Zhao

DOI: https://doi.org/10.1016/j.optcom.2007.05.013

IF: 2.4

2007-01-01

Optics Communications

Abstract:In order to study the effect of diffraction focusing characteristics of microlens arrays on the parallel laser direct writing quality, we use nonparaxial approximation to analyze the diffraction focus characteristic of a single microlens, take into consideration the cross-talk effect of a number of microlenses on the diffraction focusing characteristics of an array, and establish a theoretical focusing intensity model of a microlens array to describe the influence of a change in F-number and/or center distance on the diffraction focusing characteristics of a parallel laser direct writing system while incident writing laser is normal. Numerical simulation results indicate that there is a cross-talk effect among microlenses which increases as the F-number increases when the center distance is the same as the smaller aperture, and parallel writing quality can be improved by reducing or totally eliminating the cross-talk effect by reducing F-number and/or increasing center distance.
Study on Simulation and Experiment of Foundational Solidification Process for Stereo Photo Lithography

MA De-sheng,WANG Xiang,ZHAO Gang,HUANG Wen-hao

2005-01-01

Abstract:In the process of solidification by UV laser to liquid photopolymer, the technical parameters including the diameter of spot, exposure intensity and the scan speed have a direct effect on the solidifiedform This paper begins with the theoretical analysis of the Gaussian beam that focuses on the width, height and the precision of the elementary planar solidifiedforms, such as lines and arcsIt educes the nonlinear positive correlation relationship and the exponential relationship respectively, which cover the width, height of the line and the processing parameters Through the computed modeling by MATLAB, the closely effects of exposure intensity and scanning speed on precision of solidified form are obtained The errors of solidified form rise along with the speed increasing especially when the scan speed exceed 600 _m/s, which is greatly approximated to the experiment results.Eventually, the approved solidified-forms and precision of the broken line's corners is achieved by optimizing the process parameters and scan methods.
Simulation of the Proximity Effect of Electron Beam Lithography

X Sun,SF You,P Xiao,ZJ Ding

DOI: https://doi.org/10.7498/aps.55.148

IF: 0.906

2006-01-01

Acta Physica Sinica

Abstract:Electron beam lithography has high sensitivity since it is free from limitation from diffraction effect. It will be the mostcommon technique of the next generation lithography to replace the conventional optical lithography. The proximity effect is the most important limitation of the sensitivity of lithography,which is simulated with Monte Carlo method in this paper.The influence on proximity effect of the shape and energy of electron beam and the material and depth of substrate is analyzed. The simulation results are compared with the experimental data and are found to fit well. It is found that, the proximity effect shown by Gaussian shaped electron beam is much larger than that by ideal electron beam, and lager atomic number, thicker substrate and lower energy of the electron beam will cause lager proximity effect independently.
Computer Simulation of Photosensitive Process of Image Materials

XW Li,YC Sun,XY Hu,LS Zhang

DOI: https://doi.org/10.1117/12.441582

2001-01-01

Abstract:Silver halide emulsion is an important component of image materials. They are widely used in many kinds of fields and have a very prosperous prospect. This kind of method provides a new way to research the photosensitive process of image materials. Compared with the traditional methods, it is more economical and has a shorter experimental period. In this paper, Nucleation and Growth model and Monte Carlo method were adopted to simulate the formation of image and results in different kinds of outside conditions and material properties will be given.
Surface Modeling and Influencing Factors for Microlens Array by Slow Tool Servo Machining

Yazhou Sun,Zhicheng He,Cong Fu,Zhenwei Xie,Bohan Zhang,Haitao Liu

DOI: https://doi.org/10.1016/j.jmapro.2023.07.037

IF: 5.684

2023-01-01

Journal of Manufacturing Processes

Abstract:Microlens arrays (MLAs) are widely used in a variety of important fields due to their unique optical properties. Slow tool servo machining (STSM)technology is a manufacturing technology for machining non-rotationally symmetric surfaces. In order to solve the problems of many influencing factors of STSM machining quality, high experimental trial and error cost, and mutual limitation of accuracy and efficiency, on the basis of analyzing and determining reasonable tool trajectories, a microlens array machining surface morphology prediction model is established from the theoretical point of view, and the prediction model is optimized by combining the twodimensional Gaussian filtering method, and the surface accuracy and roughness are used to evaluate the processing quality. The prediction model is used to analyze the influence, like feed per revolution, radius of tool tip, and tool setting error on the surface quality. After the Microlens machining experiments, the results are matched with the simulation, which shows us the model is correct, and the MLAs were machined by the optimal parameters with the surface shape error PV = 0.741 & mu;m, surface roughness Sa = 22 nm, Sq = 28 nm, and Sz = 59 nm.

The Simulation Analysis for Photolithography Process of Microlens Array

Simulation and Experimental Investigation of Immersion Flow Field in Immersion Lithography

Simulation for Effect of Process Parameters on Surface Profile in Thick Film Photolithography

Simulation of Solidification Process of Micro Stereo Photolithography

Simulation Of Imaging And Refocusing For Light Field Photography

Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Characterization of process and machine dynamics on the precision replication of microlens arrays using microinjection moulding

Simulation Of The Velocity Distribution For Immersion Lithography

Design and Simulation for the Bifocal Microlens in Thick Film Lithography

SIMULATING PRESSURE DISTRIBUTION ON LENS RELEVANT TO FLUID INJECTION FOR IMMERSION LITHOGRAPHY

Study on the Surface Topography Changes of Photoresist in the Design and Fabrication of Microlens Array

Simulation and pattern distortion analysis of UV-LIGA based on the partial coherent light theory

Litholab: a new environment for micro-lithography modeling

Optimization of Solidification Process Parameters in Micro Stereo Lithography

Simulation of Light-Field Camera Imaging Based on Ray Splitting Monte Carlo Method

A Simple Method for Shape Modulation in Microlens Array Fabrication Via Spin-Coating Process

Model analysis of effect of diffraction focus characteristics of microlens arrays on parallel laser direct writing quality

Study on Simulation and Experiment of Foundational Solidification Process for Stereo Photo Lithography

Simulation of the Proximity Effect of Electron Beam Lithography

Computer Simulation of Photosensitive Process of Image Materials

Surface Modeling and Influencing Factors for Microlens Array by Slow Tool Servo Machining