New insight into the removal process of benzotriazole UV stabilizers by UV/H<sub>2</sub>O<sub>2</sub>: Integrating quantum chemical calculation with CFD simulation

Liao Gao,Hongjin Wu,Juan Dang,Shibo Zhang,Shuai Tian,Qingzhu Zhang,Wenxing Wang
DOI: https://doi.org/10.1016/j.jhazmat.2023.132245
IF: 13.6
2023-01-01
Journal of Hazardous Materials
Abstract:Benzotriazole UV stabilizers (BT-UVs) are important UV absorbers. As high-production chemicals and potential hazards, their ubiquitous presence in aquatic environments is of greatly pressing concern. Herein, the removal of six typical BT-UVs by UV/H2O2 was comprehensively investigated by quantum chemistry calculation integrated with CFD simulation. Utilizing such a micro and macro incorporated model in treating contaminants is the first report. From the micro-view, degradation mechanisms of BT-UVs by center dot OH oxidation were determined, and corresponding rate constants were obtained with values of 10(9)similar to 10(10) M(- 1)s(- 1). In a macroscopic aspect, combining the established kinetic model and CFD simulation, the effects of UV lamp power (P), volumetric flow rate (Q(v)), and H2O2 dosage ([H2O2](0)) on removal yields of BT-UVs were expounded, increasing P or [H2O2](0) or decreasing Q(v) are effective in improving removal yields of BT-UVs, but the enhancement was abated when P or [H2O2](0) increased to a certain level. When [H2O2](0) is 5 mg/L and Q(v) is decreased from 0.1 to 0.05 m(3)/h, the removal yields of BT-UVs could achieve more than 95% (P = 150 W) and 99% (P = 250 W), respectively. This work provides a new interdisciplinary insight for investigating organic contaminant removal in potential industrial applications of UV/H2O2 systems.
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