Dual Attention Embedded Reconstruction Distillation for Unsupervised Yarn-dyed Fabric Defect Detection

Hongwei Zhang,Shuaibo Liu,Liping Meng,Shuai Lu,Pengfei Li
DOI: https://doi.org/10.1109/DDCLS58216.2023.10166540
2023-01-01
Abstract:Detecting defects of yarn-dyed fabrics automatically in industrial scenarios can improve economic efficiency, but the scarcity of defect samples makes the task more challenging in the customized and small-batch production scenario. At present, most reconstruction-based methods have high requirements on the effect of reconstructing the defect area into the normal area, and the reconstruction performance often determines the final defect detection result. To solve this problem, this paper proposes an unsupervised learning framework of dual attention embedded reconstruction distillation (DAERD). Firstly, different from the encoder-encoder structure of traditional distillation, the teacher-student network in this paper adopts the encoder-decoder structure. The purpose of the student network is to restore the normal feature representation of the pre-trained teacher network. Secondly, this paper proposes a dual attention residual module (DARM), which can effectively remove redundant information and defective feature information from the teacher network through the double feature weight allocation mechanism. This helps the student network to recover the normal feature information output by the teacher network. Finally, the multi-level training deployment at the feature level in this paper aims to make the model obtain accurate defect detection results. The proposed method has been experimentally verified on the YDFID-1 dataset. The results show that this method has good performance in detecting and locating fabric defects.
What problem does this paper attempt to address?