High Efficiency Silicon Nitride Grating Coupler with DBR

Huijuan Zhang,Chao Li,Xiaoguang Tu,Haifeng Zhou,Xianshu Luo,Mingbin Yu,Guo‐Qiang Lo

DOI: https://doi.org/10.1364/ofc.2014.th1a.4

2014-01-01

Abstract:We have designed and demonstrated high efficiency Silicon nitride grating couplers with two periods of distributed Bragg reflectors at 1490 nm. The peak coupling efficiency is ~−2.6 dB and the 1-dB bandwidth is ~53 nm.

What problem does this paper attempt to address?

Fabrication-friendly High-Efficiency Silicon Nitride Grating Coupler

Pengfei Xu,Yanfeng Zhang,Zengkai Shao,Lin Liu,Lidan Zhou,Chunchuan Yang,Yujie Chen,Siyuan Yu

DOI: https://doi.org/10.1109/cleopr.2017.8118727

2017-01-01

Abstract:Grating coupler, as one of the key components can provide convenient on-wafer testing and packaging for integrated photonics. Silicon nitride (SiNx) grating coupler suffers from lower efficiency due to the relative low material refractive index. The efficiency of SiNx grating coupler can be improved by using high reflectivity silicon grating reflectors underneath. However, such silicon grating reflector requires several fabrication steps, including lithography, etching, high precision alignment (HPA), and chemical mechanical polishing (CMP). In this work, we demonstrate an easy-to-fabricate SiNx grating coupler only requiring a single patterning step without the need of HPA and CMP. A coupling coefficient of -2.5 dB and 1-dB-bandwidth of 65 nm have been experimentally measured.
High-efficiency Wideband SiNx-on-SOI Grating Coupler with Low Fabrication Complexity.

Pengfei Xu,Yanfeng Zhang,Zengkai Shao,Lin Liu,Lidan Zhou,Chunchuan Yang,Yujie Chen,Siyuan Yu

DOI: https://doi.org/10.1364/ol.42.003391

IF: 3.6

2017-01-01

Optics Letters

Abstract:The chip-fiber grating coupler is a fundamental building block in integrated photonics, providing convenient on-wafer testing and packaging. Couplers based on a silicon nitride (SiNx) material platform can achieve wider bandwidths than silicon-based couplers, but suffer from lower efficiency due to the relative low material refractive index. The efficiency of the SiNx grating coupler can be improved by using high-reflectivity silicon grating reflectors underneath. However, such a silicon grating reflector requires several fabrication steps, including lithography, etching, high precision alignment (HPA), and chemical mechanical polishing (CMP). In this Letter, we demonstrate an easy-to-fabricate SiNx-on-SOI transverse-electric mode grating coupler requiring only one patterning step (grating alone), and without the need for HPA and CMP. A coupling coefficient of -2.5 dB and 1-dB-bandwidth of 65 nm has been experimentally measured.
High-efficiency hybrid amorphous silicon grating couplers for sub-micron-sized lithium niobate waveguides.

Jian Jian,Pengfei Xu,Hui Chen,Mingbo He,Zeru Wu,Lidan Zhou,Lin Liu,Chunchuan Yang,Siyuan Yu

DOI: https://doi.org/10.1364/OE.26.029651

IF: 3.8

2018-01-01

Optics Express

Abstract:We demonstrate hybrid amorphous silicon uniform grating couplers for efficient coupling between the standard single-mode fiber and sub-micron lithium niobate waveguides. The grating couplers exhibit coupling efficiency of -3.06 dB and 1-dB bandwidth of 55 nm. The amorphous silicon grating couplers can also provide a universal building block applicable to other photonic platforms such as silicon nitride waveguides, whose moderate refractive index values prevent high efficiency grating couplers to be fabricated in the native waveguide. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
High-efficiency Apodized-Imaging Chip-Fiber Grating Coupler for Silicon Nitride Waveguides

Yang Chen,Robert Halir,Inigo Molina-Fernandez,Pavel Cheben,Jian-Jun He

DOI: https://doi.org/10.1364/ol.41.005059

2016-01-01

Abstract:Chip-fiber grating couplers have been widely used in silicon-on-insulator platforms. In silicon nitride waveguides, the lower index contrast yields gratings with a weaker radiation strength and poor directionality, thereby limiting the coupling efficiency. Here we propose and design an apodized self-imaging grating coupler in silicon nitride that images an in-plane waveguide input to an output optical fiber placed at a specific distance above the chip. Both amplitude and phase apodizations are employed to engineer the transfer function of the self-imaging grating to produce an image field matching the fiber mode profile. Two-step etch staircase grating teeth are used to achieve directionality as high as 93%. Full three-dimensional finite-difference time-domain simulations show coupling from a 40 μm×40 μm grating to an SMF-28 single mode fiber with a record calculated efficiency of 86% (0.66 dB loss) and a 3 dB bandwidth of 40 nm near the 1550 nm wavelength.
High Efficiency Grating Coupler for Coupling Between Single-Mode Fiber and SOI Waveguides

Zhang Can,Sun Jing-Hua,Xiao Xi,Sun Wei-Min,Zhang Xiao-Jun,Chu Tao,Yu Jin-Zhong,Yu

DOI: https://doi.org/10.1088/0256-307x/30/1/014207

2013-01-01

Chinese Physics Letters

Abstract:A high efficiency grating coupler between single-mode fiber and silicon-on-insulator waveguide is designed by a formula method. Over 78.5% coupling efficiency (>−1.05 dB) with 3 dB bandwidth about 50 nm for one grating coupler is obtained experimentally and this result is the highest one as far as we know. This grating coupler is CMOS compatible which needs only one etch-step and is designed for a standard SOI chip without any Bragg reflector or bottom reflector.
A high efficiency silicon nitride waveguide grating coupler with a multilayer bottom reflector

Jianxun Hong,Andrew M. Spring,Feng Qiu,Shiyoshi Yokoyama

DOI: https://doi.org/10.1038/s41598-019-49324-5

IF: 4.6

2019-09-10

Scientific Reports

Abstract:Abstract We propose a high efficiency apodized grating coupler with a bottom reflector for silicon nitride photonic integrated circuits. The reflector consists of a stack of alternate silicon nitride and silicon dioxide quarter-wave films. The design, fabrication and optical characterization of the couplers has been presented. The measured fiber to detector insertion loss was −3.5 dB which corresponds to a peak coupling efficiency of −1.75 dB. A 3 dB wavelength bandwidth of 76.34 nm was demonstrated for the grating coupler with a 20-layer reflector. The fabrication process is CMOS-compatible and requires only a single etching step.

multidisciplinary sciences
High-efficiency Dual-Level Heterogenous Grating Coupler on CMOS-compatible Silicon-Lithium Niobate Platform

Nina Xiong,Jing Wang,Haoru Yang,Bowen Ma,Weiwen Zou

DOI: https://doi.org/10.1063/5.0215468

IF: 4

2024-01-01

Applied Physics Letters

Abstract:We present the design and experimental demonstration of multilayer etched CMOS-compatible grating couplers with high efficiency on a heterogeneous silicon-lithium niobate platform. The dual-level grating coupler comprises 90 nm-thick Si waveguides and 220 nm-thick Si grating with a linear chirped structure without etching LN. The design changes the grating diffraction properties, which not only reduce back reflection but also improve directionality and fiber-to-chip mode match. In comparison with existing studies, this work achieves high coupling efficiency solely through CMOS-compatible etching without additional bottom reflectors or high-index overlays. Theoretical calculations predict a fiber-to-chip coupling efficiency of -1.76 dB and an off-chip diffraction efficiency of -1.1 dB for the TE mode. The experimental measurement of the peak coupling efficiency is -2.84 dB with the back reflection as low as -26 dB. The grating coupler paves the way for monolithic integration of Si and LN.
High-Efficiency Unidirectional Dual-Wavelength-Band Grating Coupler with 1D Subwavelength Structure

Haoyang Tan,Baobao Chen,Yi Zhao,Shiming Gao,Xiaowei Guan

DOI: https://doi.org/10.1109/lpt.2023.3326185

IF: 2.6

2023-01-01

IEEE Photonics Technology Letters

Abstract:A unidirectional dual-wavelength-band grating coupler with one-dimensional (1D) subwavelength structures is proposed and experimentally demonstrated. Inverse optimization method is used for the design and the grating coupler fabricated on the silicon-on-insulator chip can achieve efficient fiber-chip coupling simultaneously in the O-band and the L-band. The peak coupling efficiencies in the two bands are measured to be 19.7% and 19.5% with 3-dB bandwidths of 27 and 38-nm, respectively.
High-efficiency Grating Coupler Based on Fast Directional Optimization and Robust Layout Strategy in 130 Nm CMOS Process.

Xiangyu Luo,Guangcan Mi,Yanbo Li,Tao Chu

DOI: https://doi.org/10.1364/ol.452054

IF: 3.6

2022-01-01

Optics Letters

Abstract:We experimentally demonstrated a high-efficiency grating coupler by combining an interleaved etch and apodized structure for fiber-to-chip coupling. The grating coupler was optimized using the fast directional optimization method to achieve apodization. The grating coupler utilized a layout strategy involving an extended mask to avoid alignment errors for a multi-etch structure. The coupling efficiency was measured to be -2.2 dB at a wavelength of 1549 nm with a 3 dB bandwidth of 47 nm. The grating coupler, having no gold reflector, subwavelength index matching structure, or additional material layers, was fabricated using a commercial silicon photonics process with a minimum feature size of 140 nm. This grating coupler design provides a robust and effective coupling scheme and the proposed method can be employed to adopt the design in accordance with standard foundry design rules.
High-efficiency grating-couplers: demonstration of a new design strategy

Riccardo Marchetti,Cosimo Lacava,Ali Khokhar,Xia Chen,Ilaria Cristiani,David J. Richardson,Graham T. Reed,Periklis Petropoulos,Paolo Minzioni

DOI: https://doi.org/10.1038/s41598-017-16505-z

IF: 4.6

2017-11-30

Scientific Reports

Abstract:We present a simple and practical strategy that allows to design high-efficiency grating couplers. The technique is based on the simultaneous apodization of two structural parameters: the grating period and the fill-factor, along with the optimization of the grating coupler etching depth. Considering a 260 nm Si-thick Silicon-on-insulator platform, we numerically demonstrated a coupling efficiency of −0.8 dB (83%), well matching the experimental value of −0.9 dB (81%). Thanks to the optimized design, these results represent the best performance ever reported in the literature for SOI structures without the use of any back-reflector.

multidisciplinary sciences
Experimental Demonstration of an Apodized-Imaging Chip-Fiber Grating Coupler for Si_3N_4 Waveguides

Yang Chen,Thalia Dominguez Bucio,Ali Z. Khokhar,Mehdi Banakar,Katarzyna Grabska,Frederic Y. Gardes,Robert Halir,Inigo Molina-Fernandez,Pavel Cheben,Jian-Jun He

DOI: https://doi.org/10.1364/ol.42.003566

2017-01-01

Abstract:A silicon nitride waveguide is a promising platform for integrated photonics, particularly due to its low propagation loss compared to other complementary metal-oxide-semiconductor compatible waveguides, including silicon-on-insulator. Input/output coupling in such thin optical waveguides is a key issue for practical implementations. Fiber-to-chip grating couplers in silicon nitride usually exhibit low coupling efficiency because the moderate index contrast leads to weak radiation strengths and poor directionality. Here, we present the first, to the best of our knowledge, experimental demonstration of a recently proposed apodized-imaging fiber-to-chip grating coupler in silicon nitride that images an in-plane waveguide mode to an optical fiber placed at a specific distance above the chip. By employing amplitude and phase apodization, the diffracted optical field of the grating is matched to the fiber mode. High grating directionality is achieved by using staircase grating teeth, which produce a blazing effect. Experimental results demonstrate an apodized-imaging grating coupler with a record coupling efficiency of -1.5 dB and a 3 dB bandwidth of 60 nm in the C-band. (C) 2017 Optical Society of America
High-Efficiency Metamaterial-Engineered Grating Couplers for Silicon Nitride Photonics

William Fraser,Radovan Korček,Ivan Glesk,Jan Litvik,Jens H. Schmid,Pavel Cheben,Winnie N. Ye,Daniel Benedikovic

DOI: https://doi.org/10.3390/nano14070581

IF: 5.3

2024-03-27

Nanomaterials

Abstract:Silicon nitride (Si3N4) is an ideal candidate for the development of low-loss photonic integrated circuits. However, efficient light coupling between standard optical fibers and Si3N4 chips remains a significant challenge. For vertical grating couplers, the lower index contrast yields a weak grating strength, which translates to long diffractive structures, limiting the coupling performance. In response to the rise of hybrid photonic platforms, the adoption of multi-layer grating arrangements has emerged as a promising strategy to enhance the performance of Si3N4 couplers. In this work, we present the design of high-efficiency surface grating couplers for the Si3N4 platform with an amorphous silicon (α-Si) overlay. The surface grating, fully formed in an α-Si waveguide layer, utilizes subwavelength grating (SWG)-engineered metamaterials, enabling simple realization through single-step patterning. This not only provides an extra degree of freedom for controlling the fiber–chip coupling but also facilitates portability to existing foundry fabrication processes. Using rigorous three-dimensional (3D) finite-difference time-domain (FDTD) simulations, a metamaterial-engineered grating coupler is designed with a coupling efficiency of −1.7 dB at an operating wavelength of 1.31 μm, with a 1 dB bandwidth of 31 nm. Our proposed design presents a novel approach to developing high-efficiency fiber–chip interfaces for the silicon nitride integration platform for a wide range of applications, including datacom and quantum photonics.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
Compact High-Efficiency Perfectly-Vertical Grating Coupler on Silicon at O-band.

Siya Wang,Yue Hong,Yuntao Zhu,Jingye Chen,Shengqian Gao,Xinlun Cai,Yaocheng Shi,Liu

DOI: https://doi.org/10.1364/oe.25.022032

IF: 3.8

2017-01-01

Optics Express

Abstract:A compact, high-efficiency grating coupler is demonstrated for interfacing a silicon waveguide and a perfectly-vertical fiber at O-band. The grating lies on a tilted silicon membrane for minimizing the reflections. Circular grating lines are adopted to shorten the overall device length to about 60μm. 57% peak coupling efficiency and >28nm 1-dB coupling bandwidth are obtained experimentally. Back reflections of 1% to the silicon waveguide and the single mode fiber are theoretically estimated. The processing flow to realize the proposed structure is discussed in detail. The fabrication control over the tilted angle of the silicon membrane is investigated. The approach by applying an oxide cladding to improve the stability of the membrane is also introduced. The present grating coupler is compatible to common fabrication processes for silicon photonic chips.
High-performance Subwavelength Grating Coupler Based on High-Reflectivity Grating Reflector

Junbo Yang,Zhang Jingjing,Suzhi Xu,Shengli Chang

DOI: https://doi.org/10.1117/1.oe.53.9.096107

IF: 1.3

2014-01-01

Optical Engineering

Abstract:A high-performance and compact binary blazed subwavelength grating coupler was designed, which consists of the upper grating coupler and the lower layer grating reflector. A large part of light transmitted out to the substrate due to the existence of gratings can be efficiently reflected with normal incidence. Then, the propagating light is augmented and the coupling efficiency obtains its maximum value. By the appropriate choice of grating parameters, including thicknesses, periods, height, and filling factor, a coupling efficiency of beyond 80% at wavelengths from 1.535 to 1.555 mu m is calculated. Finally, the device layout is simple, feasible, and compatible with standard complementary metal-oxide semiconductor technology processing. (C) 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
High-Efficiency and Polarization-Insensitive Grating Couplers on Thin-Film Lithium Niobate Waveguides

Haoyang Tan,Zhaoyang Chen,Bin Chen,Shiming Gao,Xiaowei Guan

DOI: https://doi.org/10.1364/cleo_at.2024.atu4m.1

2024-01-01

Abstract:We demonstrate polarization-insensitive grating couplers on thin-film lithium niobate waveguides. Inverse optimization method is used and the fabricated couplers exhibit efficiencies of - 6 dB for the TE mode and - 6.5 dB for the TM mode.
High-efficiency self-focusing metamaterial grating coupler in silicon nitride with amorphous silicon overlay

William Fraser,Daniel Benedikovic,Radovan Korcek,Maziyar Milanizadeh,Dan-Xia Xu,Jens H. Schmid,Pavel Cheben,Winnie N. Ye

DOI: https://doi.org/10.1038/s41598-024-62336-0

IF: 4.6

2024-05-24

Scientific Reports

Abstract:Efficient fiber-chip coupling interfaces are critically important for integrated photonics. Since surface gratings diffract optical signals vertically out of the chip, these couplers can be placed anywhere in the circuit allowing for wafer-scale testing. While state-of-the-art grating couplers have been developed for silicon-on-insulator (SOI) waveguides, the moderate index contrast of silicon nitride (SiN) presents an outstanding challenge for implementing efficient surface grating couplers on this platform. Due to the reduced grating strength, a longer structure is required to radiate the light from the chip which produces a diffracted field that is too wide to couple into the fiber. In this work, we present a novel grating coupler architecture for silicon nitride photonic integrated circuits that utilizes an amorphous silicon (α-Si) overlay. The high refractive index of the α-Si overlay breaks the coupler's vertical symmetry which increases the directionality. We implement subwavelength metamaterial apodization to optimize the overlap of the diffracted field with the optical fiber Gaussian mode profile. Furthermore, the phase of the diffracted beam is engineered to focalize the field into an SMF-28 optical fiber placed 55 μm above the surface of the chip. The coupler was designed using rigorous three-dimensional (3D) finite-difference time-domain (FDTD) simulations supported by genetic algorithm optimization. Our grating coupler has a footprint of 26.8 × 32.7 μm 2 and operates in the O -band centered at 1.31 μm. It achieves a high directionality of 85% and a field overlap of 90% with a target fiber mode size of 9.2 μm at the focal plane. Our simulations predict a peak coupling efficiency of − 1.3 dB with a 1-dB bandwidth of 31 nm. The α-Si/SiN grating architecture presented in this work enables the development of compact and efficient optical interfaces for SiN integrated photonics circuits with applications including optical communications, sensing, and quantum photonics.

multidisciplinary sciences
Dual-Wavelength-Band Grating Coupler on 220-Nm Silicon-on-Insulator with High Numerical Aperture Fiber Placed Perfectly Vertically

Lirong Cheng,Simei Mao,Xin Tu,H. Y. Fu

DOI: https://doi.org/10.1109/jlt.2021.3090172

IF: 4.7

2021-01-01

Journal of Lightwave Technology

Abstract:We propose and design a novel dual-wavelength-band grating coupler on 220-nm-thick silicon-on-insulator and experimentally investigate its capability to couple two wavelength bands simultaneously under surface-normal fiber placement. Such dual-wavelength-band operation take advantage of a dual-etch grating design not only with increased directionality but also with unique diffraction angle dispersion characteristics for the two targeted wavelength bands. The role of high numerical aperture fiber is theoretically investigated, leading to reduced angular sensitivity in general and subsequently increased coupling efficiency for our proposed dual-wavelength-band operation scheme. Our device is further fabricated using 248-nm deep-UV lithography on an 8-inch wafer for verification. The peak coupling efficiency is measured to be -5.0 dB at 1275 nm and -5.9 dB at 1519 nm for O-band and S/C-band respectively.
Efficient Grating Couplers for Optical Fibers to Ultra-Low-loss Waveguides

Yongjun Guo,Zhuang Ma,Xin Tong,Lin Zhang

DOI: https://doi.org/10.1117/12.2609349

2022-01-01

Abstract:Grating couplers are one of the building blocks in silicon (Si) photonics. A lithium niobate-on-insulator (LNOI) platform has a wide transparency window, an exceptional electro-optic performance, and a favorable mechanical property. Here we propose a grating coupler on the LNOI platform for an optical fiber to an ultra-low-loss silicon nitride (Si3N4) waveguide. Titanium dioxide (TiO2) has a negative thermo-optic coefficient and can be used to compensate the temperature drift of cores with positive thermo-optic coefficients. Here, a TiO2 layer on the high-aspect-ratio Si3N4 core is used for the athermal operation. The fundamental TE mode at a wavelength of 1550 nm is used as an input from the ultra-low-loss waveguide. We achieve a high directionality of 68% at the fixed wavelength. A coupling efficiency of 48% can be obtained. A 3-dB bandwidth of 60 nm from 1520 to 1580 nm is presented by the proposed grating coupler.
Scalable and efficient grating couplers on low-index photonic platforms enabled by cryogenic deep silicon etching

Emma Lomonte,Maik Stappers,Linus Krämer,Wolfram H. P. Pernice,Francesco Lenzini

DOI: https://doi.org/10.1038/s41598-024-53975-4

IF: 4.6

2024-02-22

Scientific Reports

Abstract:Efficient fiber-to-chip couplers for multi-port access to photonic integrated circuits are paramount for a broad class of applications, ranging, e.g., from telecommunication to photonic computing and quantum technologies. Grating-based approaches are often desirable for providing out-of-plane access to the photonic circuits. However, on photonic platforms characterized by a refractive index ≃ 2 at telecom wavelength, such as silicon nitride or thin-film lithium niobate, the limited scattering strength has thus far hindered the achievement of coupling efficiencies comparable to the ones attainable in silicon photonics. Here we present a flexible strategy for the realization of highly efficient grating couplers on such low-index photonic platforms. To simultaneously reach a high scattering efficiency and a near-unitary modal overlap with optical fibers, we make use of self-imaging gratings designed with a negative diffraction angle. To ensure high directionality of the diffracted light, we take advantage of a metal back-reflector patterned underneath the grating structure by cryogenic deep reactive ion etching of the silicon handle. Using silicon nitride as a testbed material, we experimentally demonstrate coupling efficiency up to − 0.55 dB in the telecom C-band with high chip-scale device yield.

multidisciplinary sciences
Highly Efficient Nonuniform Grating Coupler for Silicon-on-insulator Nanophotonic Circuits.

Yongbo Tang,Zhechao Wang,Lech Wosinski,Urban Westergren,Sailing He

DOI: https://doi.org/10.1364/ol.35.001290

2010-01-01

Abstract:We present design, fabrication, and characterization of a silicon-on-insulator grating coupler of high efficiency for coupling between a silicon nanophotonic waveguide and a single mode fiber. By utilizing the lag effect of the dry etching process, a grating coupler consisting of nonuniform grooves with different widths and depths is designed and fabricated to maximize the overlapping between the upward wave and the fiber mode. The measured waveguide-to-fiber coupling efficiency of 64% (-1.9 dB) for the transverse electric polarization is achieved by the present nonuniform grating coupler directly defined on a regular silicon-on-insulator wafer.

High Efficiency Silicon Nitride Grating Coupler with DBR

Fabrication-friendly High-Efficiency Silicon Nitride Grating Coupler

High-efficiency Wideband SiNx-on-SOI Grating Coupler with Low Fabrication Complexity.

High-efficiency hybrid amorphous silicon grating couplers for sub-micron-sized lithium niobate waveguides.

High-efficiency Apodized-Imaging Chip-Fiber Grating Coupler for Silicon Nitride Waveguides

High Efficiency Grating Coupler for Coupling Between Single-Mode Fiber and SOI Waveguides

A high efficiency silicon nitride waveguide grating coupler with a multilayer bottom reflector

High-efficiency Dual-Level Heterogenous Grating Coupler on CMOS-compatible Silicon-Lithium Niobate Platform

High-Efficiency Unidirectional Dual-Wavelength-Band Grating Coupler with 1D Subwavelength Structure

High-efficiency Grating Coupler Based on Fast Directional Optimization and Robust Layout Strategy in 130 Nm CMOS Process.

High-efficiency grating-couplers: demonstration of a new design strategy

Experimental Demonstration of an Apodized-Imaging Chip-Fiber Grating Coupler for Si_3N_4 Waveguides

High-Efficiency Metamaterial-Engineered Grating Couplers for Silicon Nitride Photonics

Compact High-Efficiency Perfectly-Vertical Grating Coupler on Silicon at O-band.

High-performance Subwavelength Grating Coupler Based on High-Reflectivity Grating Reflector

High-Efficiency and Polarization-Insensitive Grating Couplers on Thin-Film Lithium Niobate Waveguides

High-efficiency self-focusing metamaterial grating coupler in silicon nitride with amorphous silicon overlay

Dual-Wavelength-Band Grating Coupler on 220-Nm Silicon-on-Insulator with High Numerical Aperture Fiber Placed Perfectly Vertically

Efficient Grating Couplers for Optical Fibers to Ultra-Low-loss Waveguides

Scalable and efficient grating couplers on low-index photonic platforms enabled by cryogenic deep silicon etching

Highly Efficient Nonuniform Grating Coupler for Silicon-on-insulator Nanophotonic Circuits.