Abstract:Particle holograms using off-axis scattering light are investigated. A code based on the near field Lorenz-Mie framework capable of calculating particle hologram with arbitrary size, location and refractive index at arbitrary off-axis scattering angle has been developed. Characteristics of off-axis particle holograms are analyzed with special attention to the strong Moiré effect and dual fringe pattern (near field). Reconstruction of off-axis scattering particle hologram is investigated, and the possibility of determining particle location, size and refractive index using near field off-axis digital holography are discussed. It is shown that for transparent particles, the typical off-axis scattering holograms are characterized by strong Moiré effect and dual fringe patterns (in near field) due to the reflected and refracted (1 or 2 order or higher) lights. When near field offaxis scattering holograms with dual fringe patterns are numerically reconstructed with wavelet-transform-based reconstruction approach, two glare spots corresponding to the reflected and refracted (or higher order refracted) light sources coming from the different parts of the particle are clearly visible. It is also shown that in geometric optics, the particle location, size and real part of refractive index can be determined as long as the locations of the two glare spots are known. It has been shown that the measurement values of particle center location, size and real part of refractive index are highly sensitive to the measurement errors of glare spots locations. However, the measurement accuracy of glare spots locations by off-axis scattering digital holographic method for the moment is not higher enough to satisfy this requirements, where further investigation to improve the measurement accuracy is then encouraged.

&Lt;title>image Processing System of Particle Automeasurement for Particle Holograms</title>

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&Lt;title&gt;image Processing System of Particle Automeasurement for Particle Holograms&lt;/title&gt;