ARTW: a Model of Author Recognition Based on Writing Style by Recognizing Style Crack

Gang Liu,Zhizheng Yan,Tongli Wang,Kai Zhan
DOI: https://doi.org/10.1145/3561877.3561898
2022-01-01
Abstract:Recently, plagiarism such as deleting keywords, changing the order of words, adjusting the sentence structure has also become more sophisticated than before. However, plagiarism detection systems usually fail to detect duplication, resulting in omissions, errors, etc. For better plagiarism detection, a model called ARTW, the word level author recognition framework inspired by writing style, extracting the writing style of the text and applying the writing style to recognize the author was proposed. The style crack indicates the position where the writing style changes and the text segmentation is performed according to the style crack. The recognition of style cracks is achieved by style feature extraction. Considering the style features from words, sentences and emotions, etc. This paper designs 7 features for style crack recognition, finds the location of the style crack based on the results of the style feature extraction combined with the clustering algorithm, and performs text segmentation according to style cracks. The author recognition is performed on each part based on the recognition of style cracks. Our experiment result shows that the ARTW model accuracy rate is 4∼5% higher than the SVM and 2∼3% higher than the Naive Bayes, which outperforms the traditional model of SVM and Naive Bayes.
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