Radical Afterglow Emission Harnessed by Doping N,N'‐Diaryl‐5,10‐Dihydrophenazines to Epoxy Resins
Yonghao Su,Xin Jin,Jianhua Su,Yanli Feng,Qiaochun Wang,Zhiyun Zhang,He Tian,Xiang Ma
DOI: https://doi.org/10.1002/adom.202300604
IF: 9
2023-05-28
Advanced Optical Materials
Abstract:A radical afterglow emission (up to 4 s) harnessed by doping N,N'‐diaryl‐5,10‐dihydrophenazines (dopants) into cycloaliphatic epoxy resins (matrix) is reported. The afterglow is related to the radical species produced by the interaction between the matrix and the dopants under continuous UV excitation. Quantum‐chemical calculations predict that inefficient spin‐orbit coupling (SOC) coefficients may hinder the afterglow emission by inhibiting the ISC process. Developing radical‐induced afterglow emission under ambient conditions is challenging since newly formed radical species are susceptible to air and water. In this work, long afterglow materials (up to 4 s) are realized by doping a series of N,N'‐diaryl‐5,10‐dihydrophenazine (DPP)derivatives into rigid cycloaliphatic epoxy resins (CER). The afterglow is found to result from the interaction between the matrix and the excited states of the dopants through the generation of radical species under continuous UV excitation, which can be regulated by the peripheral functional groups of the N‐phenyl substituents. Density functional theory (DFT) calculations predict that the introduction of electron‐withdrawing groups hinders the afterglow emission, which may be related to the reducing reduction potential and inefficient spin‐orbit coupling (SOC) coefficients. The afterglow emission of the radical‐based systems demonstrates a bright opportunity for information encryption, anti‐counterfeiting, and photolithography.
materials science, multidisciplinary,optics