Ketocoumarin-Based Photoinitiators for High-Sensitivity Two- Photon Lithography

Jin Tang,Xiaoyi Xu,Xiaoming Shen,Cuifang Kuang,Hongzheng Chen,Minmin Shi,Ning Huang

DOI: https://doi.org/10.1021/acsapm.3c00141

2023-01-01

ACS Applied Polymer Materials

Abstract:Ketocoumarins are attractive and distinct photosensi-tizers due to their high molar extinction coefficients, high intersystem crossing coefficients, and high photochemical stability. As a classic commercial ketocoumarin-based two-photon initiator, 7-diethylamino-3-thenoylcoumarin (DETC) was widely used in two-photon lithog-raphy. However, the large fluorescence quantum yield and low two-photon absorption cross section value greatly limit its application in high-throughput nanofabrication. In this work, a series of DETC derivatives were developed by extending the length of the alkyl chain and integrating different donor and acceptor groups. These ketocoumarin-based initiators, namely, compounds 1-7, were designed, synthesized, and unambiguously characterized. Compared with DETC, these compounds exhibit higher molar extinction coefficient, lower fluorescence quantum yield, higher two-photon absorption cross section, and improved sensitivity in two-photon lithography. Among these molecules, compound 7 with expanded pi-electron systems and structures with enhanced intramolecular charge transfer exhibits the best sensitivity in two-photon lithography. With compound 7-based photoresist, many kinds of complex three-dimensional patterns can be fabricated using two-photon lithography at a writing speed of up to 60 mm s-1. The high two-photon initiation sensitivity makes these compounds promising candidates for commercialization and provides a new design concept for the development of new initiators.