Enhanced Formation of Trichloronitromethane Precursors During UV/monochloramine Treatment

Xinran Zhang,Jiaxin Zhai,Yu Lei,Huang,Pengfei Ren,Dimitra Lambropoulou,Xin Yang
DOI: https://doi.org/10.1016/j.jhazmat.2021.126813
IF: 13.6
2022-01-01
Journal of Hazardous Materials
Abstract:This study systematically investigates the formation of trichloronitromethane (TCNM) from 2 natural waters, 6 humic substances and 16 phenolic compounds during UV/monochloramine (UV/NH2Cl) followed by post-chloramination. Using N-15-NH2Cl as an isotope tracer, we found that N-15-TCNM accounted for 70.7-76.5% of total TCNM during UV/NH2Cl treated 2 natural waters, which was significantly higher than the proportion of N-15-TCNM in chloramination (NH2Cl alone). This is a direct evidence that NH2Cl, rather than the nitrogenous matters in waters, was the predominant nitrogen source of TCNM during UV/NH2Cl treatment. Phenol derivatives with meta-substituents and with electron-withdrawing groups facilitated the formation of TCNM precursors during UV/NH2Cl treatment. Significant correlations were found between Hammett constants (sigma) of substituents and TCNM formation potentials. The formation mechanisms of TCNM were revealed using resorcinol as a representative phenolic compound. During UV/NH2Cl treatment, HO center dot, reactive chlorine species and reactive nitrogen species contributed to 28.1%, 29.0% and 19.4% of resorcinol degradation. Five nitro(so)-intermediates were identified as the main TCNM precursors. The formation pathways of TCNM were proposed. Alkaline pH was recommended to reduce the formation of TCNM precursors during UV/NH2Cl treatment.
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