Research Progress of High Entropy Alloy Thin Films Prepared by Magnetron Sputtering

Luo Peng,Wang Xiaobo,Gong Chunzhi,Tian Xiubo
DOI: https://doi.org/10.11933/j.issn.1007-9289.20210526001
2021-01-01
China surface engineering
Abstract:As a new alloy material, multi-principal component high-entropy alloy breaks the traditional alloy design concept of one or two main elements, and is composed of at least five main elements. The high entropy effect makes it have more advantages than traditional alloys in performance, such as high hardness, high strength, high temperature oxidation resistance, corrosion resistance, etc. The properties and preparation techniques of high entropy alloy films have attracted much attention from academia and industry. Magnetron sputtering technology has been gradually applied to the preparation and performance research of high entropy alloy films because of its advantages such as low film forming temperature, dense film layer and good binding force. It has a very large engineering application prospect. This paper introduces the characteristics of direct current, radio frequency, ion beam and pulse magnetron sputtering and the application in the high entropy alloy thin film, analyzes the characteristics and law of phase structure of high entropy alloy films under different magnetron sputtering technology as well, and systematically expounds the excellent properties of the films, finally prospects the development direction of high entropy alloy films deposited by magnetron sputtering.
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