Interface Engineering for High‐Performance Photoelectrochemical Cells via Atomic Layer Deposition Technique

Shiyao Cao,Zheng Zhang,Qingliang Liao,Zhuo Kang,Yue Zhang
DOI: https://doi.org/10.1002/ente.202170023
IF: 4.149
2021-02-01
Energy Technology
Abstract:<p>A short overview of atomic layer deposition (ALD) application in the interface engineering of photoelectrochemical (PEC) cells is given. The results of ALD technology‐based interface and surface engineering for high‐performance PEC cells in recent years are summarized and the challenges and opportunities of the development of ALD‐based interface engineering for high‐performance PEC cells in the near future are discussed. More details can be found in article number <a class="linkBehavior" href="http://doi.wiley.com/10.1002/ente.202000819">2000819</a> by Zhuo Kang, Yue Zhang, and co‐workers. </p>
energy & fuels
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