Low-bias Resistive Switching in BaTiO3/Al2O3/ITO Structures with Various Thicknesses of Al2O3 Layer

He Chaotao,Lu Yu,Tang Yuanyuan,Li Xiulin,Chen Peng
DOI: https://doi.org/10.1007/s00339-021-04624-4
2021-01-01
Applied Physics A
Abstract:The resistive switching behavior is observed in the BaTiO3/Al2O3/ITO structures, which has been deposited by magnetron sputtering. With the increase in thicknesses of Al2O3 layer, the RS behaviors become weak gradually in   $$\pm \hspace{0.17em}$$ 0.75 V sweep bias voltage. Non-volatile multilevel RS behavior is observed in the BaTiO3/Al2O3/ITO device with thickness of Al2O3 layer with 30 nm. The BaTiO3/Al2O3/ITO device with thickness of 30 nm of Al2O3 layer presents low Set voltage and Reset voltage, where Set voltage is 0.48–0.75 V and Reset voltage is − 0.54 to − 0.3 V.
What problem does this paper attempt to address?