(Invited) Mueller Matrix Polarimetry: A Powerful Tool for Nanostructure Metrology

Shiyuan Liu,Xiuguo Chen,Chuanwei Zhang
DOI: https://doi.org/10.1149/06001.0237ecst
2014-01-01
ECS Transactions
Abstract:Recently, ellipsometry-based scatterometry has gained more and more attention in semiconductor manufacturing. Among the various types of ellipsometry, Mueller matrix polarimetry (MMP) can obtain up to 16 quantities of a 4×4 Mueller matrix, and consequently, MMP-based scatterometry can acquire much more useful information about the sample. In this paper, the basic principle and instrumentation of MMP are presented, and then the fundamental concept of computational metrology is introduced. Several case studies are finally provided to demonstrate the potential of MMP in nanostructure metrology.
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