Block copolymer lithography for scalable near-infrared graphene plasmonic devices

Joel Siegel,Jonathan H. Dwyer,Anjali Suresh,Margaret Fortman,Nathaniel S. Safron,Chenghao Wan,Jonathan W. Choi,Wei Wei,Vivek Saraswat,Mikhail A. Kats,Michael S. Arnold,Padma Gopalan,Victor W. Brar
DOI: https://doi.org/10.1117/12.2571066
2020-01-01
Abstract:Patterning graphene into nanostructures enables the coupling of free space radiation to plasmons in graphene. These plasmons are highly tunable and have been used in such applications as tunable filters and chemical sensors in the THz and mid-infrared ranges, with graphene structures with characteristic dimensions of 15 nm of greater. Here, we will demonstrate that block copolymer based fabrication can create sub 15 nm plasmonically active graphene nanostructures in a scalable, efficient, and repeatable manner. Furthermore, we will report the first measurement of a near-infrared graphene plasmon resonance and discuss some implications for next-generation optoelectrical devices.
What problem does this paper attempt to address?